Tetramethylammonium Ion

Tetramethylammonium Ion

SCHEMBL8104302

C[N+](C)(C)C.O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.38

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Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA2 P00918 5/20 0.38
CA1 P00915 4/20 0.38
MMP1 P03956 4/20 0.38
MMP2 P08253 4/20 0.38
MMP9 P14780 4/20 0.38
MMP8 P22894 4/20 0.38
MMP13 P45452 4/20 0.38
F2 P00734 4/20 0.34
PRSS1 P07477 4/20 0.34
PRSS2 P07478 4/20 0.34
PRSS3 P35030 4/20 0.34
ALDH1A1 P00352 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetramethylammonium Ion SCHEMBL548456 0.93 CA2 (0.46) CA2CA1MMP1MMP2MMP9
Tetramethylammonium Ion SCHEMBL8101338 0.91 CA2 (0.48) CA2CA1MMP1MMP2MMP9
Tetramethylammonium Ion SCHEMBL4802835 0.91 CA2 (0.48) CA2CA1MMP1MMP2MMP9
SCHEMBL39694 0.89 CA2 (0.44) CA2CA1MMP1MMP2MMP9
SCHEMBL6912907 0.87 CA2 (0.42) CA2CA1MMP1MMP2MMP9
Hydrochloric Acid SCHEMBL18725326 0.87 CA2 (0.42) CA2CA1MMP1MMP2MMP9
SCHEMBL4341499 0.87 CA2 (0.42) CA2CA1MMP1MMP2MMP9
Fluoride SCHEMBL11078578 0.87 CA2 (0.42) CA2CA1MMP1MMP2MMP9
SCHEMBL6909020 0.87 CA2 (0.42) CA2CA1MMP1MMP2MMP9
SCHEMBL5960809 0.87 CA2 (0.42) CA2CA1MMP1MMP2MMP9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6132928-A Coating solution for forming antireflective coating film TOKYO OHKA KOGYO CO., LTD. (JP) 2000-10-17 US disclosed
US-5783362-A Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-07-21 US disclosed
US-5631314-A Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition TOKYO OHKA KOGYO CO., LTD. (JP) 1997-05-20 US disclosed