Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 11/20 | 0.48 |
| ▸ | CA1 | P00915 | 10/20 | 0.48 |
| ▸ | MMP1 | P03956 | 6/20 | 0.48 |
| ▸ | MMP2 | P08253 | 6/20 | 0.48 |
| ▸ | MMP9 | P14780 | 6/20 | 0.48 |
| ▸ | MMP8 | P22894 | 6/20 | 0.48 |
| ▸ | MMP13 | P45452 | 6/20 | 0.48 |
| ▸ | F2 | P00734 | 4/20 | 0.44 |
| ▸ | PRSS1 | P07477 | 4/20 | 0.44 |
| ▸ | PRSS2 | P07478 | 4/20 | 0.44 |
| ▸ | PRSS3 | P35030 | 4/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetramethylammonium Ion SCHEMBL8101338 | 1.00 | CA2 (0.48) | CA2CA1MMP1MMP2MMP9 | |
| Tetramethylammonium Ion SCHEMBL548456 | 0.98 | CA2 (0.46) | CA2CA1MMP1MMP2MMP9 | |
| Hydrogen Sulfide SCHEMBL1743653 | 0.93 | CA2 (0.54) | CA2CA1MMP1MMP2MMP9 | |
| Tetramethylammonium Ion SCHEMBL8104302 | 0.91 | CA2 (0.38) | CA2CA1MMP1MMP2MMP9 | |
| Hydrogen Sulfide SCHEMBL4241412 | 0.91 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL24140 | 0.91 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL615754 | 0.91 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3140314 | 0.91 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3139152 | 0.91 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL332726 | 0.91 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7384730-B2 | Top coating composition for photoresist and method of forming photoresist pattern using same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-06-10 | — | — | US | claimed |
| US-20060275697-A1 | Top coating composition for photoresist and method of forming photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-12-07 | — | — | US | claimed |
| US-20060111550-A1 | Top coating composition for photoresist and method of forming photoresist pattern using same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-05-25 | — | — | US | claimed |
| US-7384730-B2 | Top coating composition for photoresist and method of forming photoresist pattern using same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-06-10 | — | — | US | disclosed |
| US-20060275697-A1 | Top coating composition for photoresist and method of forming photoresist pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-12-07 | — | — | US | disclosed |
| US-20060111550-A1 | Top coating composition for photoresist and method of forming photoresist pattern using same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-05-25 | — | — | US | disclosed |
| US-6132928-A | Coating solution for forming antireflective coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-10-17 | — | — | US | disclosed |
| US-5783362-A | Liquid coating composition for use in forming photoresist coating films and a photoresist material using said composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-07-21 | — | — | US | disclosed |
| US-5631314-A | Liquid coating composition for use in forming photoresist coating films and photoresist material using said composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-05-20 | — | — | US | disclosed |
| US-4041003-A | Process for molding aromatic polycarbonates having perfluoroalkanesulphonic acid derivatives as mold release agents | BAYER AKTIENGESELLSCHAFT (DT) | 1977-08-09 | — | — | US | disclosed |