SCHEMBL8130488

SCHEMBL8130488

CC(=COc1ccc2ccccc2c1O)C(=O)O

nearest known ligand 0.45

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.45
ABCG2 Q9UNQ0 2/20 0.41
CYP1B1 Q16678 2/20 0.40
NCEH1 Q6PIU2 2/20 0.40
CYP1A1 P04798 1/20 0.40
CYP1A2 P05177 2/20 0.40
CYP2C9 P11712 2/20 0.40
CYP2C19 P33261 2/20 0.40
MTNR1A P48039 1/20 0.40
MTNR1B P49286 1/20 0.40
CYP3A4 P08684 1/20 0.40
POLB P06746 1/20 0.40
GPR35 Q9HC97 1/20 0.40
HSD17B10 Q99714 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9160548 0.83 ALDH1A1 (0.51) HSD17B10
SCHEMBL8130485 0.79 KDM4E (0.42) LDHAABCG2CYP1B1CYP1A1CYP1A2
SCHEMBL10186707 0.76 PTPN22 (0.48) LDHAABCG2CYP1B1CYP1A1CYP1A2
SCHEMBL23111255 0.75 GPR84 (0.41) CYP1B1CYP1A1CYP1A2CYP2C9CYP2C19
SCHEMBL6142391 0.74 NCEH1 (0.51) LDHANCEH1
SCHEMBL27374622 0.74 AKR1C3 (0.44) CYP2C9HSD17B10
SCHEMBL217075 0.73 ESR1 (0.49) CYP3A4POLBHSD17B10
SCHEMBL18889148 0.73 PTPN22 (0.48) LDHACYP1A2CYP2C9CYP2C19HSD17B10
SCHEMBL7761409 0.73 LDHA (0.55) LDHAABCG2CYP1B1NCEH1CYP1A1
SCHEMBL2808856 0.72 PTPN7 (0.47) CYP1B1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6045968-A COMPRISING AN ACID-DECOMPOSABLE NOVOLAK RESIN, AN ALKALI-SOLUBLE RESIN AND A PHOTO-ACID GENERATING AGENT; HIGH ALKALI SOLUBILITY, HIGH RESOLUTION, AND HIGH REPRODUCIBILITY KABUSHIKI KAISHA TOSHIBA (JP) 2000-04-04 US disclosed
US-5837419-A ACID DECOMPOSABLE RESIN, PHOTO-ACID GENERATING AGENT AND NAPHTHOL NOVOLAK KABUSHIKI KAISHA TOSHIBA (JP) 1998-11-17 US disclosed