Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 3/20 | 0.32 |
| ▸ | RAB9A | P51151 | 3/20 | 0.32 |
| ▸ | JAK2 | O60674 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9078634 | 0.83 | CASP1 (0.46) | NPC1RAB9AJAK2MAPTHTT | |
| SCHEMBL10907064 | 0.78 | ALDH1A1 (0.53) | — | |
| SCHEMBL2117455 | 0.75 | KMT2A (0.32) | KMT2A | |
| SCHEMBL2363476 | 0.75 | — | — | |
| SCHEMBL27906532 | 0.75 | CASP1 (0.52) | NPC1RAB9AJAK2MAPTHTT | |
| SCHEMBL10710919 | 0.71 | — | — | |
| SCHEMBL11012026 | 0.71 | — | — | |
| SCHEMBL2117448 | 0.71 | — | — | |
| SCHEMBL14143667 | 0.67 | CASP1 (0.32) | — | |
| SCHEMBL874436 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 659 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025046146-A1 | POLYPEPTIDE SCREENING | Bicycle TX Limited (GB) | 2025-03-06 | — | — | WO | claimed |
| US-20230350293-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2023-11-02 | — | — | US | claimed |
| EP-4220301-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | Young Chang Chemical Co., Ltd. (KR) | 2023-08-02 | — | — | EP | claimed |
| CN-116194842-A | Negative photoresist composition for I-line for improving step difference and LER between center and edge, and negative photoresist composition for I-line for improving process margin | 荣昌化学制品株式会社 | 2023-05-30 | — | — | CN | claimed |
| WO-2022065713-A1 | I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR REDUCING HEIGHT DIFFERENCE BETWEEN CENTER AND EDGE AND REDUCING LER, AND I-LINE NEGATIVE PHOTORESIST COMPOSITION FOR IMPROVING PROCESS MARGIN | 영창케미칼 주식회사 | 2022-03-31 | — | — | WO | claimed |
| CN-110128570-A | Dendritic photosensitizer, synthetic method and the application of the segment containing benzidion | 郑州工程技术学院 | 2019-08-16 | — | — | CN | claimed |
| US-20180246404-A1 | I-LINE NEGATIVE TYPE PHOTORESIST COMPOSITION HAVING EXCELLENT ETCHING RESISTANCE | YCCHEM CO., LTD. (KR) | 2018-08-30 | — | — | US | claimed |
| CN-107924124-A | Negative photoresist composition for I-line with excellent etching resistance | 荣昌化学制品株式会社 | 2018-04-17 | — | — | CN | claimed |
| CN-105152945-A | Triphenylamine visible light photosensitizer containing two aromatic substituent groups and application thereof | UNIV CHONGQING | 2015-12-16 | — | — | CN | claimed |
| CN-105061642-A | Naphthol photosensitizer containing aliphatic chain fragment, and synthesis and application thereof | UNIV CHONGQING | 2015-11-18 | — | — | CN | claimed |
| CN-104877057-A | Coumarin fragment-containing benzotriazole photosensitizer and synthesis and application thereof | UNIV CHONGQING | 2015-09-02 | — | — | CN | claimed |
| CN-104693323-A | Naphthalene nucleus contained visible light photosensitizer of conjugated structure and application thereof | UNIV CHONGQING | 2015-06-10 | — | — | CN | claimed |
| CN-104693322-A | Phenyl vinyl imino group class visible light photosensitizer of conjugated structure and application thereof | UNIV CHONGQING | 2015-06-10 | — | — | CN | claimed |
| CN-102558397-B | Benzotriazole near ultraviolet photosensitizer with conjugation structure as well as synthesis and application of benzotriazole near ultraviolet photosensitizer | UNIV CHONGQING | 2013-06-12 | — | — | CN | claimed |
| US-20030176520-A1 | 4-cyanocoumarin derivatives and uses thereof | KABUSHIKI KAISHA HAYASHIBARA SEIBUTSU KAGAKU KENKYUJO (JP) | 2003-09-18 | — | — | US | claimed |
| US-20020052501-A1 | 4-cyanocoumarin derivatives and uses thereof | KABUSHIKI KAISHA HAYASHIBARA SEIBUTSU KAGAKU KENKYUJO (JP) | 2002-05-02 | — | — | US | claimed |
| EP-1041074-A1 | Light-sensitive 4-cyanocoumarin derivatives | KABUSHIKI KAISHA HAYASHIBARA SEIBUTSU KAGAKU KENKYUJO (JP) | 2000-10-04 | — | — | EP | claimed |
| JP-63273686-A | — | — | None | — | — | JP | disclosed |
| US-4481276-A | ARGON LASER | FUJI PHOTO FILM CO., LTD. (JP) | 1984-11-06 | — | — | US | disclosed |
| US-4259432-A | HIGH SENSITIVITY TO ULTRAVIOLET RADIATION AND ARGON LASER RAYS | FUJI PHOTO FILM CO., LTD. (JP) | 1981-03-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030176520-A1 | 4-cyanocoumarin derivatives and uses thereof | CACYBP, CYBA, IK | NPC1 4286/4885RAB9A 4409/4885JAK2 2333/4885 |
| US-20020052501-A1 | 4-cyanocoumarin derivatives and uses thereof | CACYBP, CYBA, IK | NPC1 4286/4885RAB9A 4409/4885JAK2 2333/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.