SCHEMBL8167265

SCHEMBL8167265

Cc1ccc(Oc2ccc(C)c(N)c2)cc1N

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NR4A1 P22736 1/20 0.61
ALDH1A1 P00352 9/20 0.54
TDP1 Q9NUW8 5/20 0.54
CASP1 P29466 1/20 0.54
CYP3A4 P08684 4/20 0.50
SMN1; SMN2 Q16637 5/20 0.46
MAPT P10636 6/20 0.46
KMT2A Q03164 5/20 0.46
MEN1 O00255 4/20 0.46
HPGD P15428 1/20 0.46
TEAD4 Q15561 1/20 0.44
GFER P55789 2/20 0.43
GAA P10253 2/20 0.43
POLB P06746 1/20 0.43
MITF O75030 1/20 0.43
NLRP1 Q9C000 1/20 0.43
NOD2 Q9HC29 1/20 0.43
LMNA P02545 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
TSHR P16473 3/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23075692 0.93 MAPT (0.54) NR4A1ALDH1A1TDP1CASP1CYP3A4
SCHEMBL24710427 0.93 NR4A1 (0.74) NR4A1ALDH1A1TDP1CASP1CYP3A4
SCHEMBL8644207 0.91 ALDH1A1 (0.61) NR4A1ALDH1A1TDP1CASP1CYP3A4
SCHEMBL14407074 0.91 TEAD4 (0.59) NR4A1ALDH1A1TDP1CASP1CYP3A4
SCHEMBL13783384 0.91 NR4A1 (0.58) NR4A1ALDH1A1TDP1CASP1CYP3A4
SCHEMBL12369413 0.89 MAOA (0.54) NR4A1ALDH1A1TDP1CASP1SMN1; SMN2
Hydrochloric Acid SCHEMBL2276176 0.88 MAOA (0.52) NR4A1ALDH1A1TDP1CASP1CYP3A4
SCHEMBL17508257 0.88 CASP1 (0.50) NR4A1ALDH1A1TDP1CASP1CYP3A4
SCHEMBL27840745 0.88 NR4A1 (0.48) NR4A1ALDH1A1TDP1CASP1CYP3A4
SCHEMBL14407101 0.86 NR4A1 (0.47) NR4A1ALDH1A1TDP1CASP1CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2016020112-A1 OXIDATION DYE PRECURSOR HENKEL AG & CO. KGAA (DE) 2016-02-11 WO claimed
WO-2022210788-A1 PHOTOSENSITIVE RESIN COMPOSITION 味の素株式会社 2022-10-06 WO disclosed
EP-3825342-A1 POLYIMIDE-POLYARYLENE POLYMERS Rohm and Haas Electronic Materials LLC (US) 2021-05-26 EP disclosed
EP-3187528-A1 COMPOSITION FOR PREPARING TRANSPARENT POLYMER FILM, TRANSPARENT POLYMER FILM, AND ELECTRONIC DEVICE INCLUDING SAME Samsung Electronics Co., Ltd. (KR) 2017-07-05 EP disclosed
WO-2016020112-A1 OXIDATION DYE PRECURSOR HENKEL AG & CO. KGAA (DE) 2016-02-11 WO disclosed
WO-2016020112-A1 OXIDATION DYE PRECURSOR HENKEL AG & CO. KGAA (DE) 2016-02-11 WO disclosed
US-8932801-B2 Photosensitive polyimides ETERNAL CHEMICAL CO., LTD. (CN) 2015-01-13 US disclosed
US-20090181324-A1 PHOTOSENSITIVE POLYIMIDES ETERNAL CHEMICAL CO., LTD. 2009-07-16 US disclosed
US-6051722-A PRECURSOR FOR POLYIMIDE COPOLYMER; USABLE IN OPTICAL LONG-DISTANCE COMMUNICATION, SIGNAL PROCESSING, PHOTOELECTRIC HYBRID CIRCUITS AND OPTICAL COMPUTERS HITACHI CHEMICAL COMPANY, LTD. (JP) 2000-04-18 US disclosed