SCHEMBL819336

SCHEMBL819336

C=C(C)C(=O)NCC(C)(C)N

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.35
TGFBR1 P36897 1/20 0.34
ALDH1A1 P00352 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL10707472 0.98 TGFBR1 (0.33) TDP1TGFBR1ALDH1A1
Acrylamide SCHEMBL28161965 0.89 ALDH1A1 (0.38) TDP1ALDH1A1
Vinyl Ether SCHEMBL28166135 0.88
SCHEMBL13862890 0.82 SMN1; SMN2 (0.45) TDP1TGFBR1ALDH1A1SMN1; SMN2HSD17B10
SCHEMBL3232710 0.82 TGFBR1 (0.36) TDP1TGFBR1ALDH1A1SMN1; SMN2HSD17B10
SCHEMBL321577 0.80 TGFBR1 (0.35) TDP1TGFBR1ALDH1A1SMN1; SMN2HSD17B10
SCHEMBL163137 0.79 GRM4 (0.33) TDP1TGFBR1
SCHEMBL5693540 0.79 KDM4E (0.38) TDP1TGFBR1SMN1; SMN2HSD17B10
SCHEMBL28842148 0.78 TGFBR1 (0.34) TGFBR1ALDH1A1SMN1; SMN2HSD17B10
Hydrochloric Acid SCHEMBL9818683 0.78 GRM4 (0.32) TDP1TGFBR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106930142-A Drying strengthening agent composition and the method for improving paper dry strength 艺康美国股份有限公司 2017-07-07 CN claimed
CN-1334830-A Hydrophilic ampholytic polymer GOODRICH CO B F (US) 2002-02-06 CN claimed
US-11147902-B2 Polymeric coatings and methods for cell attachment SURMODICS, INC. (US) 2021-10-19 US disclosed
CN-109863028-A Multilayer structure making and its purposes 株式会社可乐丽 2019-06-07 CN disclosed
CN-109789078-A Resin binder composition based on (methyl) acrylate 赢创有限公司 2019-05-21 CN disclosed
CN-104045769-B Conjugated diene polymer, and the polymer composition containing the polymer 住友化学株式会社 2018-10-30 CN disclosed
CN-108713242-A The grinding method and composition for polishing set group of silicon substrate 福吉米株式会社 2018-10-26 CN disclosed
CN-104995277-B Composition for polishing, composition for polishing manufacture method and abrasive material manufacture method 福吉米株式会社 2018-05-08 CN disclosed
CN-104098744-B Conjugated diene polymer, and the polymer composition containing the polymer 住友化学株式会社 2018-02-16 CN disclosed
CN-104045768-B Conjugated diene polymer, and the polymer composition containing the polymer 住友化学株式会社 2018-02-16 CN disclosed
CN-107652395-A The preparation method of conjugated diene polymer, conjugated diene polymer and conjugated diene polymer composition 住友化学株式会社 2018-02-02 CN disclosed
CN-1201061-A Chemical-ray sensitive polymer composition TORAY CO LTD (JP) 1998-12-09 CN disclosed
US-5674668-A Photographic recording material AGFA-GEVAERT (DE) 1997-10-07 US disclosed
EP-0762197-A1 Photographic recording material Agfa-Gevaert AG (DE) 1997-03-12 EP disclosed
US-5518877-A POLYPEPTIDE-ADDITION POLYMER AGFA-GEVAERT AG (DE) 1996-05-21 US disclosed
EP-0666498-A2 Silver halide photographic material Agfa-Gevaert AG (DE) 1995-08-09 EP disclosed
EP-0042307-B1 AN OPTICAL RECORDING ELEMENT AND A METHOD OF RECORDING INFORMATION USING THE ELEMENT EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1986-09-10 EP disclosed
US-4340655-A Thermal and mechanical barrier layers for optical recording elements EASTMAN KODAK COMPANY (US) 1982-07-20 US disclosed
EP-0042307-A2 An optical recording element and a method of recording information using the element EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1981-12-23 EP disclosed
US-4082551-A GOOD ADHESION AND BLOCKING POSITIVE CHARGED PARTICLES EASTMAN KODAK COMPANY (US) 1978-04-04 US disclosed