SCHEMBL8199820

SCHEMBL8199820

C=Cc1ccc(OCCCOCC)c(OCCCOCC)c1

nearest known ligand 0.45

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
APP P05067 1/20 0.45
KMT2A Q03164 2/20 0.42
KDM4E B2RXH2 1/20 0.42
GAA P10253 1/20 0.42
FDPS P14324 4/20 0.41
ALDH1A1 P00352 7/20 0.41
TDP1 Q9NUW8 3/20 0.40
HPGD P15428 3/20 0.40
L3MBTL1 Q9Y468 3/20 0.40
MAPT P10636 3/20 0.40
NPSR1 Q6W5P4 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
TRPA1 O75762 1/20 0.40
POLB P06746 1/20 0.40
LMNA P02545 2/20 0.38
HTT P42858 2/20 0.38
TUBB1 Q9H4B7 1/20 0.38
MEN1 O00255 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8189187 0.92 FDPS (0.46) KMT2AKDM4EGAAFDPSALDH1A1
SCHEMBL8196809 0.84 ALDH1A1 (0.45) KMT2AKDM4EFDPSALDH1A1TDP1
SCHEMBL31619156 0.83 ALDH1A1 (0.51) KMT2AKDM4EGAAALDH1A1TDP1
SCHEMBL6198028 0.83 ALDH1A1 (0.51) KMT2AKDM4EGAAALDH1A1TDP1
SCHEMBL3761372 0.82 ALDH1A1 (0.43) KDM4EGAAFDPSALDH1A1TDP1
SCHEMBL16962089 0.82 KMT2A (0.49) KMT2AKDM4EGAAFDPSALDH1A1
SCHEMBL27440601 0.77 FDPS (0.57) APPKMT2AKDM4EFDPSALDH1A1
SCHEMBL685022 0.76 FDPS (0.41) KDM4EFDPSALDH1A1TDP1HPGD
SCHEMBL16955795 0.75 KDM4E (0.61) APPKMT2AKDM4EGAAFDPS
SCHEMBL8664905 0.75 FDPS (0.54) KDM4EFDPSALDH1A1HPGDL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6022665-A BLEND OF SOLVENT, MODIFIED STYRENE POLYMER AND PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-02-08 US disclosed
US-5844057-A Polymers and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-01 US disclosed