SCHEMBL8196809

SCHEMBL8196809

C=Cc1ccc(OCCOCCCC)c(OCCOCCCC)c1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.45
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
SMN1; SMN2 Q16637 2/20 0.44
TDP1 Q9NUW8 1/20 0.44
FDPS P14324 3/20 0.43
PRKCE Q02156 1/20 0.41
PRKCQ Q04759 1/20 0.41
PRKCD Q05655 1/20 0.41
PDE4B Q07343 1/20 0.41
MAPT P10636 3/20 0.41
HPGD P15428 2/20 0.41
POLB P06746 1/20 0.41
CYP1A2 P05177 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
CYP2C19 P33261 1/20 0.41
LMNA P02545 3/20 0.40
RARB P10826 1/20 0.39
HTT P42858 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3761372 0.86 ALDH1A1 (0.43) ALDH1A1SMN1; SMN2TDP1FDPSPRKCE
SCHEMBL8189187 0.86 FDPS (0.46) ALDH1A1MEN1KMT2ASMN1; SMN2TDP1
SCHEMBL8199820 0.84 APP (0.45) ALDH1A1MEN1KMT2ASMN1; SMN2TDP1
SCHEMBL27440601 0.84 FDPS (0.57) ALDH1A1MEN1KMT2ASMN1; SMN2FDPS
SCHEMBL16962089 0.80 KMT2A (0.49) ALDH1A1MEN1KMT2ASMN1; SMN2TDP1
SCHEMBL12165988 0.80 ESR1 (0.48) ALDH1A1SMN1; SMN2TDP1PRKCEPRKCQ
SCHEMBL685022 0.79 FDPS (0.41) ALDH1A1SMN1; SMN2TDP1FDPSPRKCE
SCHEMBL8664905 0.79 FDPS (0.54) ALDH1A1SMN1; SMN2FDPSPRKCEPRKCQ
SCHEMBL2880949 0.78 FDPS (0.75) ALDH1A1MEN1KMT2ASMN1; SMN2TDP1
SCHEMBL7361734 0.78 FDPS (0.66) ALDH1A1MEN1KMT2ASMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6022665-A BLEND OF SOLVENT, MODIFIED STYRENE POLYMER AND PHOTOACID GENERATOR SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-02-08 US disclosed
US-5844057-A Polymers and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-01 US disclosed