Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 6/20 | 0.43 |
| ▸ | PTPRC | P08575 | 4/20 | 0.43 |
| ▸ | NPC1 | O15118 | 3/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | RAB9A | P51151 | 3/20 | 0.43 |
| ▸ | POLB | P06746 | 3/20 | 0.43 |
| ▸ | S100A4 | P26447 | 3/20 | 0.43 |
| ▸ | TDP2 | O95551 | 3/20 | 0.43 |
| ▸ | MEN1 | O00255 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.43 |
| ▸ | HTT | P42858 | 3/20 | 0.43 |
| ▸ | NSD2 | O96028 | 2/20 | 0.43 |
| ▸ | APAF1 | O14727 | 2/20 | 0.43 |
| ▸ | PLA2G1B | P04054 | 2/20 | 0.43 |
| ▸ | HPGD | P15428 | 2/20 | 0.43 |
| ▸ | ALOX12 | P18054 | 2/20 | 0.43 |
| ▸ | PLCG1 | P19174 | 2/20 | 0.43 |
| ▸ | PPARG | P37231 | 2/20 | 0.43 |
| ▸ | GALK1 | P51570 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30496179 | 1.00 | LMNA (0.50) | LMNASMN1; SMN2PTPRCNPC1ALDH1A1 | |
| SCHEMBL28198902 | 0.84 | PTPRC (0.54) | LMNASMN1; SMN2PTPRCNPC1ALDH1A1 | |
| SCHEMBL31107058 | 0.81 | ELANE (0.55) | LMNASMN1; SMN2PTPRCNPC1ALDH1A1 | |
| SCHEMBL13310639 | 0.81 | ELANE (0.55) | LMNASMN1; SMN2PTPRCNPC1ALDH1A1 | |
| SCHEMBL2993336 | 0.80 | SMN1; SMN2 (0.59) | LMNASMN1; SMN2PTPRCNPC1ALDH1A1 | |
| SCHEMBL188872 | 0.79 | ELANE (0.57) | LMNASMN1; SMN2PTPRCNPC1ALDH1A1 | |
| SCHEMBL2705502 | 0.78 | LMNA (0.58) | LMNASMN1; SMN2NPC1ALDH1A1RAB9A | |
| SCHEMBL14087383 | 0.77 | LMNA (0.52) | LMNASMN1; SMN2PTPRCNPC1ALDH1A1 | |
| SCHEMBL3976848 | 0.77 | SMN1; SMN2 (0.55) | LMNASMN1; SMN2PTPRCNPC1ALDH1A1 | |
| SCHEMBL29908547 | 0.77 | SMN1; SMN2 (0.55) | LMNASMN1; SMN2PTPRCNPC1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4291953-B1 | IMPROVED BLEACHING | XETOS AG (DE) | 2026-04-15 | — | — | EP | disclosed |
| EP-4291587-B1 | PHOTOPOLYMERIZABLE HOE COMPOSITION | XETOS AG (DE) | 2025-11-12 | — | — | EP | disclosed |
| US-20250277122-A1 | Photopolymerizable HOE Composition | XETOS AG (DE) | 2025-09-04 | — | — | US | disclosed |
| CN-118859628-A | Photoacid generating compounds and related polymers, photoresist compositions, and methods of forming photoresist relief images | 罗门哈斯电子材料有限责任公司 | 2024-10-29 | — | — | CN | disclosed |
| US-20240317904-A1 | Fading | XETOS AG (DE) | 2024-09-26 | — | — | US | disclosed |
| US-20240150569-A1 | 2K-System | XETOS AG (DE) | 2024-05-09 | — | — | US | disclosed |
| US-20240152047-A1 | HIGH REFRACTIVE INDEX MATERIALS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-05-09 | — | — | US | disclosed |
| CN-117945957-A | Photoacid generating compounds and related polymers, photoresist compositions, and methods of forming photoresist relief images | 罗门哈斯电子材料有限责任公司 | 2024-04-30 | — | — | CN | disclosed |
| US-11947258-B2 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | Rohm and Hass Electronic Materials LLC (US) | 2024-04-02 | — | — | US | disclosed |
| EP-4291587-A1 | PHOTOPOLYMERIZABLE HOE COMPOSITION | Xetos AG (DE) | 2023-12-20 | — | — | EP | disclosed |
| EP-4043963-A1 | IMPROVED BLEACHING | Xetos AG (DE) | 2022-08-17 | — | — | EP | disclosed |
| EP-4043961-A1 | 2K SYSTEM | Xetos AG (DE) | 2022-08-17 | — | — | EP | disclosed |
| US-20220112321-A1 | HIGH REFRACTIVE INDEX MATERIALS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2022-04-14 | — | — | US | disclosed |
| EP-3981806-A1 | HIGH REFRACTIVE INDEX MATERIALS | Rohm and Haas Electronic Materials LLC (US) | 2022-04-13 | — | — | EP | disclosed |
| US-6096144-A | TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-01 | — | — | US | disclosed |
| US-5858571-A | TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0172427-B1 | PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER | Shin-Etsu Chemical Co., Ltd. (JP) | 1989-07-05 | — | — | EP | disclosed |
| US-4758639-A | Process for production of vinyl polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-19 | — | — | US | disclosed |
| US-4757124-A | Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-12 | — | — | US | disclosed |
| EP-0172427-A2 | Process for production of vinyl chloride polymer | Shin-Etsu Chemical Co., Ltd. (JP) | 1986-02-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11947258-B2 | Photoacid-generating monomer, polymer derived therefrom, photoresist composition including the polymer, and method of forming a photoresist relief image using the photoresist composition | WASF2, FRG1, WEE2 | LMNA 4297/4885SMN1; SMN2 4140/4885PTPRC 2269/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.