SCHEMBL8215411

SCHEMBL8215411

C[Si](Cl)(Cl)CC[Si](Cl)(Cl)c1ccccc1

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.35
ESR2 Q92731 1/20 0.35
MAPT P10636 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL706034 0.88 TSHR (0.33) ESR1ESR2
SCHEMBL3225896 0.81
SCHEMBL707143 0.79 TP53 (0.35) ESR1ESR2
SCHEMBL703162 0.78 MAPT (0.31) ESR1ESR2MAPT
SCHEMBL705203 0.78 MAPT (0.31) ESR1ESR2MAPT
SCHEMBL4951387 0.77 ATM (0.33)
SCHEMBL11691875 0.76 ALDH1A1 (0.32)
SCHEMBL707927 0.76 TSHR (0.36)
SCHEMBL10786027 0.74
SCHEMBL11687361 0.74 TDP1 (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6025117-A USING POLYSILANE COPOLYMER OR DENDRIMER FILM PATTERN AS MASK FOR ETCHING INSULATING OR CONDUCTING LAYER ON SUBSTRATE KABUSHIKI KAISHA TOSHIBA (JP) 2000-02-15 US disclosed