Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC4 | P56524 | 1/20 | 0.45 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.45 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | BCHE | P06276 | 1/20 | 0.43 |
| ▸ | PTGS1 | P23219 | 2/20 | 0.41 |
| ▸ | MAOA | P21397 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.40 |
| ▸ | CASR | P41180 | 1/20 | 0.40 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.40 |
| ▸ | SCN4A | P35499 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL825382 | 0.93 | TSHR (0.42) | HDAC4HDAC2HDAC8TSHRKDM4E | |
| SCHEMBL11999043 | 0.89 | HDAC4 (0.44) | HDAC4HDAC2HDAC8TSHRKDM4E | |
| SCHEMBL19445358 | 0.87 | HDAC4 (0.45) | HDAC4HDAC2HDAC8TSHRKDM4E | |
| SCHEMBL11999045 | 0.86 | AKR1C3 (0.48) | TSHRALDH1A1PTGS1ALOX5SLC7A5 | |
| SCHEMBL825494 | 0.84 | ALDH1A1 (0.60) | TSHRALDH1A1BCHEPTGS1MAOA | |
| SCHEMBL11922929 | 0.84 | BCHE (0.60) | BCHEMAOAALOX5 | |
| SCHEMBL28346872 | 0.84 | BCHE (0.60) | BCHEMAOAALOX5 | |
| SCHEMBL17515668 | 0.83 | HDAC4 (0.43) | HDAC4HDAC2HDAC8TSHRKDM4E | |
| SCHEMBL825351 | 0.83 | KCNA3 (0.44) | ALDH1A1 | |
| SCHEMBL11996670 | 0.83 | PTGS1 (0.58) | HDAC4HDAC2HDAC8TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8142977-B2 | mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator | FUJIFILM CORPORATION (JP) | 2012-03-27 | — | — | US | disclosed |
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241749-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |