Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17166853 | 1.00 | ALDH1A1 (0.35) | ALDH1A1GAAMAPT | |
| SCHEMBL4400985 | 0.86 | ALDH1A1 (0.31) | ALDH1A1GAAMAPT | |
| SCHEMBL4401921 | 0.84 | — | — | |
| SCHEMBL9609346 | 0.82 | ALOX15 (0.36) | ALDH1A1GAAMAPT | |
| SCHEMBL25120603 | 0.81 | — | — | |
| SCHEMBL19881129 | 0.80 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT | |
| SCHEMBL74951 | 0.80 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT | |
| SCHEMBL4403854 | 0.80 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT | |
| SCHEMBL4403244 | 0.80 | ALDH1A1 (0.33) | ALDH1A1GAAMAPT | |
| SCHEMBL23382977 | 0.79 | ALDH1A1 (0.34) | ALDH1A1GAAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 268 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119866360-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-22 | — | — | CN | disclosed |
| CN-119856108-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-118302462-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2024-07-05 | — | — | CN | disclosed |
| CN-118235084-A | Liquid crystal aligning agent, liquid crystal alignment film and liquid crystal display element | 日产化学株式会社 | 2024-06-21 | — | — | CN | disclosed |
| CN-117677669-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-116601191-A | Method for producing single-layer retardation film, and polymer composition for forming single-layer retardation film | 日产化学株式会社 | 2023-08-15 | — | — | CN | disclosed |
| CN-116507643-A | Radical generating film forming composition, radical generating film, method for manufacturing liquid crystal display element, and liquid crystal display element | 日产化学株式会社 | 2023-07-28 | — | — | CN | disclosed |
| CN-116507968-A | Radical generating film forming composition, radical generating film, method for manufacturing liquid crystal display element, and liquid crystal display element | 日产化学株式会社 | 2023-07-28 | — | — | CN | disclosed |
| WO-2023120726-A1 | WEAK-ANCHORING LIQUID CRYSTAL ALIGNMENT AGENT, AND LIQUID CYRSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2023-06-29 | — | — | WO | disclosed |
| WO-2023095925-A1 | POLYMER COMPOSITION AND SINGLE-LAYER RETARDATION MATERIAL | 日産化学株式会社 | 2023-06-01 | — | — | WO | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-20070042291-A1 | Positive resist composition and a pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| US-20070042291-A1 | Positive resist composition and a pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |
| EP-1755000-A2 | Positive resist composition and a pattern forming method using the same | Fuji Photo Film Co., Ltd. (JP) | 2007-02-21 | — | — | EP | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179579-B2 | Radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| EP-1752479-A1 | ACRYLIC STAR POLYMER | NIPPON SODA CO., LTD. (JP) | 2007-02-14 | — | — | EP | disclosed |
| US-6441115-B1 | FOR USE AS CHEMICAL AMPLIFIED PHOTORESIST, COMPRISING UNITS DERIVED FROM (METH)ACRYLIC ACID, 2-ALKYL,5,6-(-(CH2)N-)NORBORN-2-YL ESTER WHERE N IS 2-6 | EVERLIGHT USA, INC. | 2002-08-27 | — | — | US | disclosed |