Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.55 |
| ▸ | TSHR | P16473 | 1/20 | 0.55 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.45 |
| ▸ | NPC1 | O15118 | 3/20 | 0.45 |
| ▸ | RAB9A | P51151 | 3/20 | 0.45 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.44 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.44 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.44 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.44 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | LSS | P48449 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.42 |
| ▸ | GRIA4 | P48058 | 1/20 | 0.42 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL825494 | 0.91 | ALDH1A1 (0.60) | ALDH1A1TSHRSLC7A5MAPTNPC1 | |
| SCHEMBL11113379 | 0.88 | ALDH1A1 (0.62) | ALDH1A1TSHRSLC7A5MAPTNPC1 | |
| SCHEMBL825382 | 0.86 | TSHR (0.42) | ALDH1A1TSHRMAPTCHRNB2CHRNB4 | |
| SCHEMBL14118337 | 0.86 | BCHE (0.55) | ALDH1A1TSHRNPC1RAB9AFFAR1 | |
| SCHEMBL6721888 | 0.86 | BCHE (0.55) | ALDH1A1TSHRNPC1RAB9AFFAR1 | |
| SCHEMBL16687011 | 0.86 | GRIA4 (0.51) | ALDH1A1TSHRCHRNB2CHRNA4GRIA4 | |
| SCHEMBL3628638 | 0.86 | GRIA4 (0.51) | ALDH1A1TSHRCHRNB2CHRNA4GRIA4 | |
| SCHEMBL14118711 | 0.85 | ALDH1A1 (0.48) | ALDH1A1TSHRSLC7A5MAPTNPC1 | |
| SCHEMBL14118566 | 0.85 | ALDH1A1 (0.48) | ALDH1A1TSHRSLC7A5MAPTNPC1 | |
| SCHEMBL14118345 | 0.83 | MMP2 (0.49) | ALDH1A1TSHRMEN1KMT2ATDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8735048-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method | FUJIFILM CORPORATION (JP) | 2014-05-27 | — | — | US | disclosed |
| US-20120301817-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2012-11-29 | — | — | US | disclosed |
| US-8142977-B2 | mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator | FUJIFILM CORPORATION (JP) | 2012-03-27 | — | — | US | disclosed |
| US-7592118-B2 | Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile | FUJIFILM CORPORATION (JP) | 2009-09-22 | — | — | US | disclosed |
| US-20080241749-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |
| US-20080241743-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2008-10-02 | — | — | US | disclosed |