SCHEMBL825625

SCHEMBL825625

CCOC(C)Oc1ccc(C(C)CC(CC)c2cccc(O)c2)cc1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC22A1 O15245 1/20 0.37
OPRM1 P35372 1/20 0.37
LTB4R Q15722 1/20 0.36
LTB4R2 Q9NPC1 1/20 0.36
HIF1A Q16665 3/20 0.34
ADRB1 P08588 2/20 0.34
ADRA1A P35348 2/20 0.34
LMNA P02545 2/20 0.34
MIF P14174 1/20 0.34
HTR2A P28223 1/20 0.34
HTR2B P41595 1/20 0.34
GALR3 O60755 1/20 0.34
SLC7A5 Q01650 1/20 0.34
TRPA1 O75762 2/20 0.33
TSHR P16473 2/20 0.33
ADRB2 P07550 1/20 0.33
HTR1A P08908 1/20 0.33
ADRA2A P08913 1/20 0.33
ADRB3 P13945 1/20 0.33
ADRA2B P18089 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825444 0.91 SLC22A1 (0.36) SLC22A1OPRM1LTB4RLTB4R2HIF1A
SCHEMBL13098434 0.86 ESR1 (0.42) OPRM1LTB4RLTB4R2ADRA1ALMNA
SCHEMBL825589 0.86 ESR1 (0.42) OPRM1LTB4RLTB4R2ADRA1ALMNA
SCHEMBL16200765 0.82 ALDH1A1 (0.34) LTB4RLTB4R2LMNASLC7A5TRPA1
SCHEMBL14067023 0.81 LTB4R (0.43) OPRM1LTB4RLTB4R2HIF1AADRA1A
SCHEMBL14066998 0.79 ESR1 (0.42) OPRM1LTB4RLTB4R2ADRA1ALMNA
SCHEMBL13098433 0.77 ESR1 (0.40) OPRM1ADRA1ALMNAMIFSLC7A5
SCHEMBL825415 0.77 ESR1 (0.40) OPRM1LTB4RLTB4R2ADRA1ALMNA
SCHEMBL13098458 0.76 ESR1 (0.40) LTB4RLTB4R2HIF1ALMNASLC7A5
SCHEMBL12578584 0.76 ESR1 (0.44) OPRM1LTB4RLTB4R2ADRA1ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed