SCHEMBL826990

SCHEMBL826990

CCOc1ccoc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL827474 0.80 LTA4H (0.47)
SCHEMBL4868844 0.77 CYP1A1 (0.33)
SCHEMBL27758295 0.77 NR5A1 (0.52)
SCHEMBL14876788 0.76
SCHEMBL515092 0.72
SCHEMBL29270294 0.72 TDP1 (0.35)
Hydrochloric Acid SCHEMBL25335680 0.71 LMNA (0.53)
SCHEMBL12267092 0.71 NPC1 (0.39)
SCHEMBL8653291 0.71
SCHEMBL5135507 0.71 MMP2 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108366994-A Novel selective inhibitors of Jak1 and uses thereof 梁从新 2018-08-03 CN claimed
EP-4080531-B1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING SAME NIPPON CHEMICON (JP) 2024-09-18 EP disclosed
CN-115073949-B Aqueous composition, cured product, and laminate 荒川化学工业株式会社 2024-07-12 CN disclosed
US-12009158-B2 Solid electrolytic capacitor and method for manufacturing same NIPPON CHEMI-CON CORPORATION (JP) 2024-06-11 US disclosed
US-11929214-B2 Hybrid electrolytic capacitor and method for manufacturing same NIPPON CHEMI-CON CORPORATION (JP) 2024-03-12 US disclosed
US-20230029692-A1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING SAME NIPPON CHEMI-CON CORPORATION (JP) 2023-02-02 US disclosed
US-20230017930-A1 HYBRID ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING SAME NIPPON CHEMI-CON CORPORATION (JP) 2023-01-19 US disclosed
EP-4080531-A1 SOLID ELECTROLYTIC CAPACITOR AND METHOD FOR MANUFACTURING SAME Nippon Chemi-Con Corporation (JP) 2022-10-26 EP disclosed
CN-115073949-A Aqueous composition, cured product and laminate 荒川化学工业株式会社 2022-09-20 CN disclosed
CN-114868217-A Hybrid electrolytic capacitor and method for manufacturing the same 日本贵弥功株式会社 2022-08-05 CN disclosed
US-20150255222-A1 POLYMERIZATION LIQUID, CONDUCTIVE POLYMER FILM OBTAINED FROM POLYMERIZATION LIQUID, AND SOLID ELECTROLYTIC CAPACITOR NIPPON CHEMI-CON CORPORATION (JP) 2015-09-10 US disclosed
US-20140016248-A1 POLYMERIZATION SOLUTION, CONDUCTIVE POLYMER FILM OBTAINED FROM THE POLYMERIZATION SOLUTION, AND SOLID ELECTROLYTIC CAPACITOR NIPPON CHEMI-CON CORPORATION (JP) 2014-01-16 US disclosed
US-8507680-B2 Production process of a heteroaryl-type boron compounds with iridium catalyst MITSUBISHI RAYON CO., LTD. (JP) 2013-08-13 US disclosed
US-20120142924-A1 PRODUCTION PROCESS OF A HETEROARYL-TYPE BORON COMPOUNDS WITH IRIDIUM CATALYST MITSUBISHI RAYON CO., LTD. (JP) 2012-06-07 US disclosed
US-8143407-B2 Process for production of heteroaryl-type boron compounds with iridium catalyst MITSUBISHI RAYON CO., LTD. (JP) 2012-03-27 US disclosed
EP-1481978-B1 PROCESS FOR PRODUCTION OF HETEROARYL-TYPE BORON COMPOUNDS WITH IRIDIUM CATALYST MITSUBISHI RAYON CO (JP) 2011-09-14 EP disclosed
US-20100010224-A1 PROCESS FOR PRODUCTION OF HETEROARYL-TYPE BORON COMPOUNDS WITH IRIDIUM CATALYST MITSUBISHI RAYON CO., LTD. (JP) 2010-01-14 US disclosed
US-7612218-B2 Process for production of heteroaryl-type boron compounds with iridium catalyst MITSUBISHI RAYON CO., LTD. (JP) 2009-11-03 US disclosed
US-20050148775-A1 Process for production of heteroaryl-type boron compounds with iridium catalyst MITSUBISHI RAYON CO., LTD. (JP) 2005-07-07 US disclosed
EP-1481978-A1 PROCESS FOR PRODUCTION OF HETEROARYL-TYPE BORON COMPOUNDS WITH IRIDIUM CATALYST Mitsubishi Rayon Co., Ltd. (JP) 2004-12-01 EP disclosed