SCHEMBL828545

SCHEMBL828545

C=C(CCC(C)OCC)C(=O)O

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GABRP O00591 2/20 0.33
GABRD O14764 2/20 0.33
GABRA1 P14867 2/20 0.33
GABRB1 P18505 2/20 0.33
GABRG2 P18507 2/20 0.33
GABRB3 P28472 2/20 0.33
GABRA5 P31644 2/20 0.33
GABRA3 P34903 2/20 0.33
GABRA2 P47869 2/20 0.33
GABRB2 P47870 2/20 0.33
GABRA4 P48169 2/20 0.33
GABRE P78334 2/20 0.33
GABRA6 Q16445 2/20 0.33
GABRG1 Q8N1C3 2/20 0.33
GABRG3 Q99928 2/20 0.33
GABRQ Q9UN88 2/20 0.33
TET2 Q6N021 4/20 0.32
TET3 O43151 1/20 0.32
TET1 Q8NFU7 1/20 0.32
GRIK1 P39086 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14151456 0.89 GABRP (0.31) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL2121048 0.85 TDP1 (0.31) TET2TET3TET1
SCHEMBL3748664 0.82 TET2 (0.38) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL486621 0.82 TET2 (0.33) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL2119583 0.82 EPHX2 (0.34) LMNA
SCHEMBL28000464 0.81 ALDH1A1 (0.34)
SCHEMBL3427245 0.80 TET2 (0.43) TET2TET3TET1GRIK1GRIK2
SCHEMBL338900 0.80 TET2 (0.34) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL24653181 0.79 GABRP (0.54) GABRPGABRDGABRA1GABRB1GABRG2
SCHEMBL1247185 0.79 GABRP (0.54) GABRPGABRDGABRA1GABRB1GABRG2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3615580-B1 A COMPOSITION USED IN 3D PRINTING SYSTEM, ITS APPLICATION THEREOF BASF SE (DE) 2022-06-08 EP claimed
US-20200181303-A1 A COMPOSITION USED IN 3D PRINTING SYSTEM, ITS APPLICATION THEREOF BASF SE (DE) 2020-06-11 US claimed
EP-3615580-A1 A COMPOSITION USED IN 3D PRINTING SYSTEM, ITS APPLICATION THEREOF BASF SE (DE) 2020-03-04 EP claimed
WO-2018197248-A1 A COMPOSITION USED IN 3D PRINTING SYSTEM, ITS APPLICATION THEREOF BASF SE (DE) 2018-11-01 WO claimed
WO-2017012963-A1 POLYMERIZABLE FATTY ACID-DERIVATIVE-MONOMERS WITH TERMINAL OLEFINIC DOUBLE BONDS, POLYMERS CONTAINING SAME MONOMERS, PRODUCTION AND USE THEREOF BASF SE (DE) 2017-01-26 WO claimed
US-10227513-B2 Adhesive composition, adhesive film prepared from the same and display member including the same SAMSUNG SDI CO., LTD. (KR) 2019-03-12 US disclosed
EP-2342079-B1 USE OF COMPOSITE FILMS AS A PACKAGING MATERIAL FOR OXIDATION-SENSITIVE POLYMERS, METHOD FOR PACKAGING OXIDATION-SENSITIVE POLYMERS, AND PACKAGING FORMS CONTAINING SAID COMPOSITE FILMS BASF SE (DE) 2018-06-20 EP disclosed
US-20160122600-A1 ADHESIVE COMPOSITION, ADHESIVE FILM PREPARED FROM THE SAME AND DISPLAY MEMBER INCLUDING THE SAME SAMSUNG SDI CO., LTD. (KR) 2016-05-05 US disclosed
US-8710165-B2 Multibranched polymer and method for producing the same NIPPON SODA CO., LTD. (JP) 2014-04-29 US disclosed
US-20130224861-A1 METHOD FOR MANUFACTURING CELL CULTURE SUBSTRATE OSAKA ORGANIC CHEMICAL INDUSTRY LTD. (JP) 2013-08-29 US disclosed
US-8436103-B2 Star polymer and method of producing the same NIPPON SODA CO., LTD. (JP) 2013-05-07 US disclosed
EP-2039710-B1 STAR POLYMER AND METHOD FOR PRODUCING THE SAME NIPPON SODA CO (JP) 2013-01-02 EP disclosed
US-20080166636-A1 Polymer, Crosslinked Polymer, Composition for Solid Polymer Electrolyte, Solid Polymer Electrolyte, and Adhesive Composition NIPPON SODA CO., LTD. (JP) 2008-07-10 US disclosed
EP-1847556-A1 POLYMER, CROSSLINKED POLYMER, COMPOSITION FOR SOLID POLYMER ELECTROLYTE, SOLID POLYMER ELECTROLYTE AND ADHESIVE COMPOSITION NIPPON SODA CO., LTD. (JP) 2007-10-24 EP disclosed
US-20070040145-A1 e.g.block copolymer of methoxypolyethylene glycol mono (meth)acrylate with monomers selected from unsaturated ether, alcohol, ester, nitrile, carboxy, anhydride etc.; excellent in thermal properties, physical properties and ion conductivity NIPPON SODA CO., LTD. (JP) 2007-02-22 US disclosed
EP-1667168-A1 COMPOSITION FOR POLYMER SOLID ELECTROLYTE, POLYMER SOLID ELECTROLYTE, POLYMER, POLYMER SOLID ELECTROLYTE BATTERY, ION-CONDUCTIVE MEMBRANE, COPOLYMER AND PROCESS FOR PRODUCING THE COPOLYMER NIPPON SODA CO., LTD. (JP) 2006-06-07 EP disclosed
US-20050256256-A1 Block polymer of polymethoxypolyethylene glycol monomethyl methacrylate and polystyrene; LiClO4 a lithium salt as electrolyte; living copolymerization, block polymerization; excellent thermal characteristics, physical characteristics, and ionic conductivity; secondary batteries NIPPON SODA CO., LTD (JP) 2005-11-17 US disclosed
EP-0346734-B1 Derivatives of benzophenone and their preparation BASF AG (DE) 1993-11-03 EP disclosed
US-5241002-A High-solid paints, adhesives and coatings from a curable hydrolyzed acetal or ketal-containing methacrylic ester polymer and isocyanate hardener DAINIPPON INK AND CHEMICALS, LTD. (JP) 1993-08-31 US disclosed
US-5194547-A Methacrylic acid ester polymer containing at least one acetal or ketal group; paints, adhesives, molding materials DAINIPPON INK & CHEMICALS, INC. (JP) 1993-03-16 US disclosed