SCHEMBL829980

SCHEMBL829980

O=C(O)c1ccc(C(F)(c2ccc(C(=O)O)c(C(=O)O)c2)C(F)(F)C(F)(F)F)cc1C(=O)O

nearest known ligand 0.47

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 3/20 0.47
KDM4E B2RXH2 2/20 0.47
ALDH1A1 P00352 2/20 0.47
HPGD P15428 2/20 0.47
TDP1 Q9NUW8 1/20 0.42
USP2 O75604 1/20 0.41
CYP2C19 P33261 1/20 0.41
SORT1 Q99523 13/20 0.41
RXRA P19793 1/20 0.38
RXRB P28702 1/20 0.38
CES2 O00748 2/20 0.38
CDC25A P30304 1/20 0.38
CDC25B P30305 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL1093471 0.98 HSD17B10 (0.46) HSD17B10KDM4EALDH1A1HPGDTDP1
SCHEMBL28722893 0.86 RXRB (0.44) HSD17B10KDM4EALDH1A1HPGDUSP2
SCHEMBL8923161 0.85 HSD17B10 (0.47) HSD17B10KDM4EALDH1A1HPGDTDP1
SCHEMBL8676346 0.85 HSD17B10 (0.47) HSD17B10KDM4EALDH1A1HPGDTDP1
SCHEMBL28359746 0.84 ALDH1A1 (0.70) HSD17B10KDM4EALDH1A1HPGDTDP1
SCHEMBL8920312 0.84 HSD17B10 (0.46) HSD17B10KDM4EALDH1A1HPGDTDP1
SCHEMBL11338178 0.82 POLB (0.52) HSD17B10KDM4EALDH1A1HPGDTDP1
SCHEMBL31525219 0.82 POLB (0.52) HSD17B10KDM4EALDH1A1HPGDTDP1
SCHEMBL10442448 0.81 L3MBTL1 (0.40) HSD17B10KDM4EALDH1A1HPGDTDP1
SCHEMBL29405245 0.81 HSD17B10 (0.50) HSD17B10KDM4EALDH1A1HPGDTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 291 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240061333-A1 RESIN, POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND USE YANTAI SUNERA LLC (CN) 2024-02-22 US claimed
US-11886115-B1 Resin, positive photosensitive resin composition and use YANTAI SUNERA LLC (CN) 2024-01-30 US claimed
CN-113150277-B Self-healing polyimide conductive adhesive, preparation method, electrode plate and lithium battery 天目湖先进储能技术研究院有限公司(CN) 2023-01-13 CN claimed
CN-108602029-B Stable facilitated transfer membrane for olefin/alkane separation 环球油品公司 2021-11-16 CN claimed
US-11130844-B2 Polyamide-imide precursor, polyamide-imide film, and display device comprising same KOLON INDUSTRIES, INC. (KR) 2021-09-28 US claimed
EP-3848403-A1 POLYAMIDE-IMIDE PRECURSOR, POLYAMIDE-IMIDE FILM, AND DISPLAY DEVICE COMPRISING SAME Kolon Industries, Inc. (KR) 2021-07-14 EP claimed
EP-3241860-B1 POLYAMIDE-IMIDE PRECURSOR, POLYAMIDE-IMIDE FILM, AND DISPLAY DEVICE COMPRISING SAME KOLON INC (KR) 2021-03-24 EP claimed
US-10662290-B2 Polyamide-imide precursor, polyamide-imide film and display device comprising same KOLON INDUSTRIES, INC. (KR) 2020-05-26 US claimed
CN-110337460-A Polyamidoimide film and preparation method thereof SKC株式会社 2019-10-15 CN claimed
CN-107109039-B Durable type oxygen scavenging plastic container 格莱汉姆包装公司 2019-10-11 CN claimed
US-7041778-B1 Processable thermally stable addition polyimide for composite applications THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE AIR FORCE (US) 2006-05-09 US claimed
US-5780199-A A COPOLYAMIC ACID FROM TETRACARBOXYLIC ACID DIANHYDRIDE, ORGANIC DIAMINE, FLUORINATED DIAMINE, FLUORINATED TETRACARBOXYLIC ACID DIANHYDRIDE, A PHOTOINITIATOR AND SENSITIZER; EXPOSURE TO FORM IMAGES, PATTERNING, CROSSLINKING INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1998-07-14 US claimed
US-5464927-A Polyamic acid and polyimide from fluorinated reactant INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1995-11-07 US claimed
EP-0400635-B1 Liquid crystal device CANON KK (JP) 1995-09-27 EP claimed
US-5428102-A Low dielectric polyimides THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES NATIONAL AERONAUTICS AND SPACE ADMINISTRATION (US) 1995-06-27 US claimed
EP-0538683-A1 Polyamic acid and polyimide from fluorinated reactant International Business Machines Corporation (US) 1993-04-28 EP claimed
US-5192596-A Polyimide CANON KABUSHIKI KAISHA (JP) 1993-03-09 US claimed
WO-1991004300-A1 MISCIBLE BLENDS OF POLYBENZIMIDAZOLES AND POLYAMIDE-IMIDES HAVING FLUORINE-CONTAINING LINKING GROUPS HOECHST CELANESE CORPORATION (US) 1991-04-04 WO claimed
EP-0400635-A2 Liquid crystal device CANON KABUSHIKI KAISHA (JP) 1990-12-05 EP claimed
US-4906760-A Purification of anhydrides HOECHST CELANESE CORP. (US) 1990-03-06 US claimed