⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13131044 | 0.91 | NPC1 (0.32) | — | |
| SCHEMBL13130986 | 0.91 | NPC1 (0.32) | — | |
| SCHEMBL13130995 | 0.89 | ESR2 (0.39) | — | |
| SCHEMBL8319252 | 0.86 | ALDH1A1 (0.41) | — | |
| SCHEMBL8320903 | 0.86 | PKM (0.32) | — | |
| SCHEMBL4763549 | 0.84 | CA1 (0.39) | — | |
| SCHEMBL8320051 | 0.80 | HTT (0.33) | — | |
| SCHEMBL9115160 | 0.76 | ALDH1A1 (0.41) | — | |
| SCHEMBL9714337 | 0.76 | ESR2 (0.39) | — | |
| SCHEMBL17881929 | 0.76 | ESR2 (0.39) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8895222-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-11-25 | — | — | US | disclosed |
| US-20100248149-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | US | disclosed |
| US-5880169-A | HAVING HIGH RESOLUTION FOR FINE PATTERNING | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-03-09 | — | — | US | disclosed |
| US-5204216-A | RADIATION-SENSITIVE MIXTURE | BASF AKTIENGESELLSCHAFT (DE) | 1993-04-20 | — | — | US | disclosed |