Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 2/20 | 0.35 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.35 |
| ▸ | CHRM2 | P08172 | 2/20 | 0.34 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | GAA | P10253 | 2/20 | 0.33 |
| ▸ | CA4 | P22748 | 2/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA7 | P43166 | 1/20 | 0.33 |
| ▸ | CA9 | Q16790 | 1/20 | 0.33 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.33 |
| ▸ | KDM1A | O60341 | 1/20 | 0.33 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.33 |
| ▸ | RCOR1 | Q9UKL0 | 1/20 | 0.33 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL20994309 | 0.89 | IDO1 (0.40) | IDO1TAAR1 | |
| SCHEMBL13027232 | 0.86 | TAAR1 (0.43) | TAAR1CHRM2GAASMN1; SMN2 | |
| SCHEMBL22661051 | 0.84 | HSPA5 (0.48) | IDO1TAAR1CA12CA1CA2 | |
| SCHEMBL1972978 | 0.84 | IDO1 (0.52) | IDO1TAAR1CHRM2CHRM1ALDH1A1 | |
| SCHEMBL13027853 | 0.83 | MGAM (0.37) | — | |
| SCHEMBL6062060 | 0.83 | BPTF (0.37) | ALDH1A1GAAMAPTL3MBTL1KDM4E | |
| SCHEMBL29975538 | 0.81 | CYP1A2 (0.48) | ALDH1A1L3MBTL1CYP1A2CYP2C19ATM | |
| SCHEMBL27094920 | 0.81 | DPP4 (0.48) | CA12CA1CA2CA7CA9 | |
| SCHEMBL2817986 | 0.81 | CYP1A2 (0.48) | ALDH1A1L3MBTL1CYP1A2CYP2C19ATM | |
| SCHEMBL1968488 | 0.80 | L3MBTL1 (0.53) | ALDH1A1GAAMAPTL3MBTL1ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110446758-A | expandable silica particles | UNILEVER PLC | 2019-11-12 | — | — | CN | claimed |
| CN-109923197-A | Laundry treatment compositions comprising fragrance and silicon dioxide microparticle | 荷兰联合利华有限公司 | 2019-06-21 | — | — | CN | claimed |
| US-8481423-B2 | Methods to mitigate plasma damage in organosilicate dielectrics | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-09 | — | — | US | claimed |
| US-8128993-B2 | Anisotropic nanotube fabric layers and films and methods of forming same | NANTERO INC. (US) | 2012-03-06 | — | — | US | claimed |
| US-8039049-B2 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2011-10-18 | — | — | US | claimed |
| US-20090075472-A1 | METHODS TO MITIGATE PLASMA DAMAGE IN ORGANOSILICATE DIELECTRICS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-19 | — | — | US | claimed |
| US-7405168-B2 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMITED (JP) | 2008-07-29 | — | — | US | claimed |
| US-20080076262-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2008-03-27 | — | — | US | claimed |
| US-7345000-B2 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2008-03-18 | — | — | US | claimed |
| WO-2007040834-A2 | PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040856-A2 | PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| WO-2007040816-A2 | TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM | TOKYO ELECTRON LIMITED (JP) | 2007-04-12 | — | — | WO | claimed |
| US-20070077353-A1 | Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077781-A1 | Plural treatment step process for treating dielectric films | TOKYO ELECTRON LIMTED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070077782-A1 | Treatment of low dielectric constant films using a batch processing system | TOKYO ELECTRON LIMITED (JP) | 2007-04-05 | — | — | US | claimed |
| US-20070059211-A1 | TNT sensor containing molecularly imprinted sol gel-derived films | THE COLLEGE OF WOOSTER (US) | 2007-03-15 | — | — | US | claimed |
| WO-2006091264-A1 | METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM | TOKYO ELECTRON LIMITED (JP) | 2006-08-31 | — | — | WO | claimed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | claimed |
| EP-4569015-A1 | BIOCOMPATIBLE OXYGEN-SENSITIVE MATERIALS | Promega Corporation (US) | 2025-06-18 | — | — | EP | disclosed |
| US-20050215072-A1 | Method and system for treating a dielectric film | TOKYO ELECTRON LIMITED (JP) | 2005-09-29 | — | — | US | disclosed |