SCHEMBL8359097

SCHEMBL8359097

C=C(C(=O)O)C(C)N(C(C)(C)C)C(C)(C)C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TET2 Q6N021 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Chloromethane SCHEMBL124970 0.73 LMNA (0.30)
SCHEMBL186411 0.72 LMNA (0.32)
Chloromethane SCHEMBL28391698 0.71
Hydrochloric Acid SCHEMBL28878591 0.70 LMNA (0.31)
SCHEMBL3282753 0.70 LMNA (0.31)
Hydrochloric Acid SCHEMBL28345647 0.68 LMNA (0.30)
Bromomethane SCHEMBL7095820 0.68 LMNA (0.30)
Chloromethane SCHEMBL4598656 0.68 PGR (0.44)
SCHEMBL23313 0.68
SCHEMBL2915534 0.68 LMNA (0.46) TET2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5907001-A Process for the preparation of photopatternable polymers XEROX CORPORATION (US) 1999-05-25 US disclosed
US-4659781-A Reactive acrylic oligomer, grafted acrylic resinous composition based on said oligomer and coating composition containing the same NIPPON PAINT CO., LTD. (JP) 1987-04-21 US disclosed