Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | MEN1 | O00255 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.42 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3342120 | 0.88 | SIGMAR1 (0.43) | — | |
| SCHEMBL3482591 | 0.86 | SIGMAR1 (0.45) | — | |
| SCHEMBL585331 | 0.83 | TSHR (0.47) | TSHRPOLBKMT2AMEN1ALDH1A1 | |
| SCHEMBL13626178 | 0.81 | TSHR (0.46) | TSHRPOLBKMT2AMEN1ALDH1A1 | |
| SCHEMBL820953 | 0.81 | TSHR (0.46) | TSHRPOLBKMT2AMEN1ALDH1A1 | |
| SCHEMBL2239544 | 0.80 | SIGMAR1 (0.54) | KMT2AMEN1OPRK1 | |
| SCHEMBL14841789 | 0.80 | MEN1 (0.42) | TSHRPOLBKMT2AMEN1ALDH1A1 | |
| SCHEMBL14118736 | 0.78 | BCHE (0.46) | TSHRPOLBKMT2AMEN1ALDH1A1 | |
| SCHEMBL104982 | 0.78 | TSHR (0.43) | TSHRPOLBKMT2AMEN1ALDH1A1 | |
| SCHEMBL17929078 | 0.78 | SMN1; SMN2 (0.46) | TSHRPOLBKMT2AMEN1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2128897-B1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LTD (JP) | 2015-05-06 | — | — | EP | disclosed |
| US-8716209-B2 | Agent for post-etch treatment of silicon dielectric film, method of manufacturing semiconductor device, and semiconductor device | FUJITSU LIMITED (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-1904415-B1 | HYDROPHOBING MINERALS AND FILLER MATERIALS | DOW CORNING (US) | 2014-03-12 | — | — | EP | disclosed |
| EP-2625233-A1 | BIODEGRADABLE HYDROPHOBIC CELLULOSIC SUBSTRATES AND METHODS FOR THEIR PRODUCTION USING REACTIVE SILANES | Dow Corning Corporation (US) | 2013-08-14 | — | — | EP | disclosed |
| US-20130190429-A1 | Biodegradable Hydrophobic Cellulosic Substrates And Methods For Their Production Using Reactive Silanes | DOW CORNING CORPORATION (US) | 2013-07-25 | — | — | US | disclosed |
| WO-2012047312-A1 | BIODEGRADABLE HYDROPHOBIC CELLULOSIC SUBSTRATES AND METHODS FOR THEIR PRODUCTION USING REACTIVE SILANES | DOW CORNING CORPORATION (US) | 2012-04-12 | — | — | WO | disclosed |
| US-8142856-B2 | Preparing hydrolyzate containing polysiloxanes by hydrolyzing hydrolysable silane or hydrolysable silane mixture in presence of acid hydrolysis catalyst andcombining polysiloxane hydrolyzate with mineral and/or filler and optionally with water and/or a catalyst for condensation of the hydrolyzate | DOW CORNING CORPORATION (US) | 2012-03-27 | — | — | US | disclosed |
| US-20100007031-A1 | AGENT FOR POST-ETCH TREATMENT OF SILICON DIELECTRIC FILM, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2128897-A1 | SILICON DIELECTRIC TREATING AGENT FOR USE AFTER ETCHING, PROCESS FOR PRODUCING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | Fujitsu Limited (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-20080286474-A1 | Hydrophobing Minerals and Filler Materials | DOW SILICONES CORPORATION | 2008-11-20 | — | — | US | disclosed |
| EP-1904415-A2 | HYDROPHOBING MINERALS AND FILLER MATERIALS | Dow Corning Corporation (US) | 2008-04-02 | — | — | EP | disclosed |
| WO-2007009935-A2 | HYDROPHOBING MINERALS AND FILLER MATERIALS | DOW CORNING CORPORATION (US) | 2007-01-25 | — | — | WO | disclosed |
| EP-1006118-B1 | Method for synthesizing organosilicon compounds that contain a group bonded to silicon across the SI-C bond | DOW CORNING ASIA LTD (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-6191220-B1 | REACTING POLYMER HAVING OLEFINIC OR ACETYLENIC UNSATURATED GROUPS WITH HYDRIDE (HYDROCARBONOXY) SILANE IN PRESENCE OF PLATINUM OR PLATINUM COMPOUND CATALYST AND SILYLATED CARBOXYLIC ACID TO FORM HYDROCARBONOXYSILYL FUNCTIONAL POLYMER | DOW CORNING ASIA, LTD. (JP) | 2001-02-20 | — | — | US | disclosed |
| US-6111126-A | Method for synthesizing organosilicon compounds that contain a functional group bonded to silicon across the Si-C bond | DOW CORNING ASIA, LTD. (JP) | 2000-08-29 | — | — | US | disclosed |
| EP-1006118-A2 | Method for synthesizing organosilicon compounds that contain a group bonded to silicon across the SI-C bond | Dow Corning Asia, Ltd. (JP) | 2000-06-07 | — | — | EP | disclosed |
| US-5994573-A | Method for making triarylamine compounds having hydrocarbonoxysilyl groups | DOW CORNING ASIA, LTD. (JP) | 1999-11-30 | — | — | US | disclosed |
| US-5986124-A | Method for making compounds containing hydrocarbonoxysilyi groups by hydrosilylation using hydrido (hydrocarbonoxy) silane compounds | DOW CORNING ASIA, LTD. (JP) | 1999-11-16 | — | — | US | disclosed |