SCHEMBL8377306

SCHEMBL8377306

CCN1CC(=Cc2ccc(N(CC)CC)cc2)C(=O)C(=Cc2ccc(N(CC)CC)cc2)C1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.58
MAPT P10636 8/20 0.58
MEN1 O00255 8/20 0.58
KMT2A Q03164 8/20 0.58
LMNA P02545 6/20 0.58
POLB P06746 3/20 0.58
SMN1; SMN2 Q16637 4/20 0.52
GAA P10253 4/20 0.52
NPC1 O15118 3/20 0.52
HTT P42858 3/20 0.52
RAB9A P51151 3/20 0.52
MDM2 Q00987 3/20 0.52
ATM Q13315 2/20 0.52
MDM4 O15151 1/20 0.52
JAK2 O60674 1/20 0.52
XBP1 P17861 1/20 0.52
DRD3 P35462 1/20 0.50
MAPK1 P28482 5/20 0.49
NPSR1 Q6W5P4 3/20 0.49
HSP90AA1 P07900 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8374810 0.89 DRD3 (0.58) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL2203150 0.87 ACHE (0.57) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL2203151 0.87 ACHE (0.57) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL8376284 0.87 CYP1A2 (0.60) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL8780591 0.84 ALDH1A1 (0.66) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL51252 0.83 CYP1A2 (0.58) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL29099922 0.83 CYP1A2 (0.58) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL51253 0.83 CYP1A2 (0.58) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL2847156 0.83 CYP1A2 (0.58) ALDH1A1MAPTMEN1KMT2ALMNA
SCHEMBL8376245 0.82 CARM1 (0.57) ALDH1A1MAPTMEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0636939-B1 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL CO LTD (JP) 1999-03-03 EP disclosed
US-5811218-A IMPROVED PHOTOSENSITIVITY FOR MATERIALS CONTAINING POLYAMIC ACID AND ADDITION POLYMERIZABLE COMPOUND USED FOR PATTERN FORMATION HITACHI CHEMICAL COMPANY, LTD. (JP) 1998-09-22 US disclosed
EP-0551697-B1 Photoinitiator system and photopolymerizable composition using the same HITACHI CHEMICAL CO LTD (JP) 1997-05-14 EP disclosed
EP-0636939-A2 Photoinitiator compositions and photosensitive materials using the same HITACHI CHEMICAL COMPANY, LTD. (JP) 1995-02-01 EP disclosed
EP-0551697-A1 Photoinitiator system and photopolymerizable composition using the same HITACHI CHEMICAL CO., LTD. (JP) 1993-07-21 EP disclosed
EP-0295044-B1 PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME Hitachi Chemical Co., Ltd. (JP) 1992-04-22 EP disclosed
US-4987057-A HIGH SENSITIVITY TO VISIBLE LIGHT RAYS HITACHI CHEMICAL CO., LTD. (JP) 1991-01-22 US disclosed
EP-0295044-A2 Photoinitiator and photopolymerizable composition using the same Hitachi Chemical Co., Ltd. (JP) 1988-12-14 EP disclosed