Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 2/20 | 0.57 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.57 |
| ▸ | BCHE | P06276 | 1/20 | 0.55 |
| ▸ | MEN1 | O00255 | 6/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.52 |
| ▸ | MAPT | P10636 | 4/20 | 0.52 |
| ▸ | HTT | P42858 | 3/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | ALDH3A1 | P30838 | 1/20 | 0.50 |
| ▸ | ALDH1A3 | P47895 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 2/20 | 0.49 |
| ▸ | NPC1 | O15118 | 1/20 | 0.49 |
| ▸ | DRD3 | P35462 | 1/20 | 0.48 |
| ▸ | LMNA | P02545 | 4/20 | 0.48 |
| ▸ | GSK3B | P49841 | 1/20 | 0.48 |
| ▸ | MITF | O75030 | 1/20 | 0.48 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2203150 | 1.00 | ACHE (0.57) | ACHEPTGS2BCHEMEN1KMT2A | |
| SCHEMBL8374810 | 0.87 | DRD3 (0.58) | ACHEPTGS2MEN1KMT2AALDH1A1 | |
| SCHEMBL8377306 | 0.87 | ALDH1A1 (0.58) | ACHEMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL51252 | 0.84 | CYP1A2 (0.58) | ACHEPTGS2BCHEMEN1KMT2A | |
| SCHEMBL2847156 | 0.84 | CYP1A2 (0.58) | ACHEPTGS2BCHEMEN1KMT2A | |
| SCHEMBL51253 | 0.84 | CYP1A2 (0.58) | ACHEPTGS2BCHEMEN1KMT2A | |
| SCHEMBL29099922 | 0.84 | CYP1A2 (0.58) | ACHEPTGS2BCHEMEN1KMT2A | |
| SCHEMBL8780590 | 0.83 | ALDH1A1 (0.50) | ACHEMEN1KMT2AALDH1A1MAPT | |
| SCHEMBL17054697 | 0.83 | CYP1A2 (0.66) | ACHEPTGS2BCHEMEN1KMT2A | |
| SCHEMBL8372688 | 0.83 | CYP1A2 (0.66) | ACHEPTGS2BCHEMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7153631-B2 | Pattern-forming process using photosensitive resin composition | HITACHI CHEMICAL CO., LTD. (JP) | 2006-12-26 | — | — | US | claimed |
| EP-0551697-B1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO LTD (JP) | 1997-05-14 | — | — | EP | claimed |
| EP-0551697-A1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO., LTD. (JP) | 1993-07-21 | — | — | EP | claimed |
| US-5034429-A | An unsaturated monomer, a photoinitiator and a benzene derivative for providing a cured film | HITACHI CHEMICAL CO., LTD. (JP) | 1991-07-23 | — | — | US | claimed |
| US-4415621-A | COATING A SUBSTRATE WITH AN AMORPHOUS BINDER AND DYE; TELEVISION; DISCS; ABSORPTION | EASTMAN KODAK COMPANY (US) | 1983-11-15 | — | — | US | claimed |
| WO-2026100734-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PATTERNED CURED PRODUCT PRODUCTION METHOD, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2026-05-15 | — | — | WO | disclosed |
| WO-2026100079-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, PATTERNED CURED PRODUCT PRODUCTION METHOD, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2026-05-15 | — | — | WO | disclosed |
| US-12601970-B2 | Photosensitive resin composition, method for manufacturing patterned cured product, cured product, interlayer insulating film, cover coat layer, surface protective film, and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2026-04-14 | — | — | US | disclosed |
| US-20250341777-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND SEMICONDUCTOR ELEMENT | RESONAC CORP (JP) | 2025-11-06 | — | — | US | disclosed |
| US-20250271757-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, AND SEMICONDUCTOR ELEMENT | RESONAC CORPORATION (JP) | 2025-08-28 | — | — | US | disclosed |
| WO-2025099883-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED PRODUCT, PATTERNED CURED PRODUCT, AND ELECTRONIC COMPONENT | ＨＤマイクロシステムズ株式会社 | 2025-05-15 | — | — | WO | disclosed |
| WO-2025095080-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING CURED PATTERN PRODUCT, AND CURED PRODUCT | 株式会社レゾナック | 2025-05-08 | — | — | WO | disclosed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0373952-A2 | Photosensitive resin composition and photosensitive element using the same | Hitachi Chemical Co., Ltd. (JP) | 1990-06-20 | — | — | EP | disclosed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | disclosed |
| US-4626361-A | Binder-mixtures for optical recording layers and elements | EASTMAN KODAK COMPANY (US) | 1986-12-02 | — | — | US | disclosed |
| US-4499165-A | COMPATABILITY; STABILITY; LASERS; DATA PROCESSING | EASTMAN KODAK COMPANY (US) | 1985-02-12 | — | — | US | disclosed |
| EP-0118881-A2 | Binder-mixtures for optical recording layers and elements | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1984-09-19 | — | — | EP | disclosed |
| US-4415621-A | COATING A SUBSTRATE WITH AN AMORPHOUS BINDER AND DYE; TELEVISION; DISCS; ABSORPTION | EASTMAN KODAK COMPANY (US) | 1983-11-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12601970-B2 | Photosensitive resin composition, method for manufacturing patterned cured product, cured product, interlayer insulating film, cover coat layer, surface protective film, and electronic component | ARCN1, P4HA1, COL1A1 | ACHE 4692/4885PTGS2 1412/4885BCHE 3151/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.