Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.58 |
| ▸ | SRD5A2 | P31213 | 5/20 | 0.56 |
| ▸ | ERCC5 | P28715 | 1/20 | 0.50 |
| ▸ | FEN1 | P39748 | 1/20 | 0.50 |
| ▸ | PDPK1 | O15530 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.47 |
| ▸ | PGR | P06401 | 1/20 | 0.47 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.47 |
| ▸ | LTA4H | P09960 | 2/20 | 0.47 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.47 |
| ▸ | BAX | Q07812 | 1/20 | 0.47 |
| ▸ | BCL2 | P10415 | 1/20 | 0.47 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.47 |
| ▸ | NPY5R | Q15761 | 1/20 | 0.47 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formaldehyde SCHEMBL11207019 | 0.96 | PARP10 (0.55) | PARP10SRD5A2ERCC5FEN1PDPK1 | |
| Benzophenone SCHEMBL7809085 | 0.93 | SRD5A2 (0.64) | PARP10SRD5A2PGRAKR1C3BCL2 | |
| SCHEMBL11691009 | 0.85 | PARP10 (0.55) | PARP10SRD5A2ERCC5FEN1SMN1; SMN2 | |
| SCHEMBL19956096 | 0.85 | PARP10 (0.55) | PARP10SRD5A2ERCC5FEN1SMN1; SMN2 | |
| SCHEMBL11315530 | 0.85 | MMP1 (0.49) | PARP10PDPK1TSHR | |
| SCHEMBL27557404 | 0.83 | NAAA (0.52) | PARP10AKR1C3 | |
| SCHEMBL24188 | 0.81 | TDP1 (0.56) | PDPK1SMN1; SMN2PGRTSHR | |
| SCHEMBL10996146 | 0.81 | SRD5A2 (0.59) | PARP10SRD5A2ERCC5FEN1SMN1; SMN2 | |
| SCHEMBL8488415 | 0.81 | PARP10 (0.58) | PARP10SRD5A2ERCC5FEN1SMN1; SMN2 | |
| SCHEMBL2625197 | 0.81 | BCL2 (0.61) | PARP10SRD5A2ERCC5FEN1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3927 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260035490-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries I, LLC | 2026-02-05 | — | — | US | claimed |
| CN-120018945-A | Three-dimensional printing method for fiber composite material | MOI复合材料有限责任公司 | 2025-05-16 | — | — | CN | claimed |
| CN-119556524-A | Negative photosensitive resin composition for spacer | 上海玟昕科技有限公司 | 2025-03-04 | — | — | CN | claimed |
| CN-118295208-A | Chemical amplification type photoresist and preparation method and application thereof | 万华化学集团股份有限公司 | 2024-07-05 | — | — | CN | claimed |
| CN-117820599-B | Preparation method of ultraviolet light curing softening and cracking preventing agent, positive electrode slurry and preparation method thereof, and preparation method of positive electrode plate | 江苏一特新材料有限责任公司 | 2024-05-07 | — | — | CN | claimed |
| CN-117820599-A | Preparation method of ultraviolet light curing softening and cracking preventing agent, positive electrode slurry and preparation method thereof, and preparation method of positive electrode plate | 江苏一特新材料有限责任公司 | 2024-04-05 | — | — | CN | claimed |
| CN-117467340-A | Anti-glare composition, anti-glare film, polarizer and display device | 深圳市华星光电半导体显示技术有限公司 | 2024-01-30 | — | — | CN | claimed |
| CN-117471590-A | Antiglare layer and display device | 深圳市华星光电半导体显示技术有限公司 | 2024-01-30 | — | — | CN | claimed |
| CN-116589622-A | High-temperature-resistant photoresist film-forming resin and preparation method and application thereof | 北京化工大学 | 2023-08-15 | — | — | CN | claimed |
| CN-115521230-A | Silicon-containing monomer, photocuring composition, packaging film and organic electroluminescent device comprising packaging film | 吉林奥来德光电材料股份有限公司 | 2022-12-27 | — | — | CN | claimed |
| WO-2001096317-A1 | TRIAZINE-BASED COMPOUND COMPRISING FUNCTIONALIZED ALKYLTHIO GROUPS, AND PHOTOPOLYMERIZATION INITIATOR | LG CHEMICAL CO., LTD (KR) | 2001-12-20 | — | — | WO | claimed |
| US-6207347-B1 | URETHANE BIURET OLIGOMER. | NICHIGO-MORTON CO. LTD. (JP) | 2001-03-27 | — | — | US | claimed |
| US-5824180-A | CYANOACRYLATE ADHESIVE, METALLOCENE CURING ACCELERATOR | THREE BOND CO., LTD. (JP) | 1998-10-20 | — | — | US | claimed |
| US-5756190-A | NOVOLAK EPOXY RESIN, CURING AGENT, DILUENT, PHOTOPOLYMERIZATION CATALYST | SUMITOMO BAKELITE COMPANY LIMITED (JP) | 1998-05-26 | — | — | US | claimed |
| US-4843111-A | PROTECTIVE COATINGS | NIPPON KAYAKU KABUSHIKI KAISHA (JP) | 1989-06-27 | — | — | US | claimed |
| US-4751167-A | REDUCTION OF ADHESION OF MULTILAYER DEVICE UPON EXPOSURE TO LIGHT | KIMOTO & CO., LTD. (JP) | 1988-06-14 | — | — | US | claimed |
| EP-0029105-B1 | RADIATION CURABLE COATING COMPOSITION, PROCESS FOR COATING A SUBSTRATE THEREWITH, EYEGLASSES AND LAMINATE | GAF CORPORATION (US) | 1986-02-05 | — | — | EP | claimed |
| US-4557975-A | WEAR RESISTANCE | GENERAL ELECTRIC COMPANY (US) | 1985-12-10 | — | — | US | claimed |
| US-4319811-A | OF TRIACRYLATES AND N-BINYL IMIDO GROUP | GAF CORPORATION (US) | 1982-03-16 | — | — | US | claimed |
| EP-0029105-A2 | Radiation curable coating composition, process for coating a substrate therewith, eyeglasses and laminate | GAF CORPORATION (US) | 1981-05-27 | — | — | EP | claimed |