SCHEMBL8378973

SCHEMBL8378973

Oc1ccc(C2=NCCS2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 3/20 0.43
MAPT P10636 3/20 0.43
ALDH1A1 P00352 1/20 0.43
ATM Q13315 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.42
LMNA P02545 1/20 0.42
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
CASP3 P42574 1/20 0.41
SENP8 Q96LD8 1/20 0.41
SENP7 Q9BQF6 1/20 0.41
SENP6 Q9GZR1 1/20 0.41
ESR1 P03372 1/20 0.40
ESR2 Q92731 1/20 0.40
MEN1 O00255 1/20 0.38
USP2 O75604 1/20 0.38
TP53 P04637 1/20 0.38
PKM P14618 1/20 0.38
NFKB1 P19838 1/20 0.38
NFKB2 Q00653 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21664123 0.79 ALDH1A1 (0.47) MGLLMAPTALDH1A1ATMSMN1; SMN2
SCHEMBL5777989 0.79 ALDH1A1 (0.43) MGLLMAPTALDH1A1ATMSMN1; SMN2
SCHEMBL27605025 0.77 LMNA (0.56) ALDH1A1SMN1; SMN2LMNAESR1ESR2
SCHEMBL21663870 0.77 MAPT (0.48) MGLLMAPTALDH1A1ATMSMN1; SMN2
SCHEMBL10231621 0.70 LMNA (0.41) MGLLMAPTALDH1A1ATMSMN1; SMN2
SCHEMBL18624160 0.69 CYP2A6 (0.43) MGLLMAPTALDH1A1ATMSMN1; SMN2
SCHEMBL518175 0.69 LMNA (0.41) MGLLMAPTALDH1A1ATMSMN1; SMN2
SCHEMBL14874969 0.69 SMN1; SMN2 (0.44) MGLLMAPTALDH1A1ATMSMN1; SMN2
SCHEMBL22057583 0.68 MAPT (0.47) MGLLMAPTALDH1A1ATMSMN1; SMN2
SCHEMBL6170485 0.67 CYP2A6 (0.50) MAPTALDH1A1ATMSMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 203 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104403097-B High-yield polyphenyl ether manufacturing method for improving reaction safety 南亚塑胶工业股份有限公司 2017-05-17 CN claimed
CN-106661502-A Whitening composition 荷兰联合利华有限公司 2017-05-10 CN claimed
CN-106462064-A Positive photosensitive resin composition 昭和电工株式会社 2017-02-22 CN claimed
CN-105860076-A Storage-stable polymaleimide prepolymer compositions 亨斯迈先进材料美国有限责任公司 2016-08-17 CN claimed
CN-105814159-A Adhesive composition for heat insulating material with improved adhesive force 乐金华奥斯有限公司 2016-07-27 CN claimed
CN-103762830-B Mining high-voltage converter 江苏中联电气股份有限公司 2016-07-06 CN claimed
CN-103987770-B Maleimide resin CYTEC INDUSTRIES INC. (US) 2016-01-20 CN claimed
CN-105073836-A Curable mixtures based on xylylene bismaleimide EVONIK DEGUSSA GMBH 2015-11-18 CN claimed
CN-104403097-A High-yield polyphenyl ether manufacturing method for improving reaction safety NANYA PLASTICS CORP 2015-03-11 CN claimed
CN-103987770-A Maleimide resin CYTEC IND INC 2014-08-13 CN claimed
CN-102660202-B Method for preparing adhesive coating and adhesive film based on layer-by-layer assembly technology UNIV JILIN 2013-11-06 CN claimed
CN-101501141-B Bituminous products and aqueous emulsions based on bituminous products and uses thereof CECA SA 2013-05-08 CN claimed
CN-102660202-A Method for preparing adhesive coating and adhesive film based on layer-by-layer assembly technology UNIV JILIN 2012-09-12 CN claimed
CN-102356099-A Phosphoric acid resistant polymaleimide prepolymer compositions HUNTSMAN ADV MAT AMERICAS INC 2012-02-15 CN claimed
CN-101283061-B Ultraviolet-curable hybrid-curable inkjet ink composition and solder resist using same PRINTAR LTD 2012-01-25 CN claimed
CN-101189302-B Bituminous products, the mixture thereof with aggregates and the use thereof CECA SA 2011-10-05 CN claimed
CN-101980604-A Storage stable polymaleimide prepolymer compositions HUNTSMAN ADV MAT AMERICAS INC 2011-02-23 CN claimed
CN-101283061-A Ultraviolet-curable hybrid-curable inkjet ink composition and solder resist using same PRINTAR LTD (IL) 2008-10-08 CN claimed
CN-1651439-A Blocked phenolic silanes CROMPTON CORP (US) 2005-08-10 CN claimed
CN-85101459-A Photosensitive sizing material based on the sour compound that ruptures of energy quilt 1987-01-17 CN claimed