SCHEMBL8385102

SCHEMBL8385102

O=CCCC(Cl)C(=O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28117319 0.86 HIF1A (0.39)
SCHEMBL27974503 0.84 TBXAS1 (0.40)
SCHEMBL28117796 0.82 TBXAS1 (0.42)
SCHEMBL28267625 0.82 TBXAS1 (0.42)
SCHEMBL28017293 0.82 TBXAS1 (0.42)
SCHEMBL27402335 0.80
SCHEMBL28365989 0.78
SCHEMBL2193910 0.78 LMNA (0.50)
SCHEMBL27670416 0.76 LMNA (0.33)
SCHEMBL7841090 0.76 ENPEP (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111875557-B Thiazole derivative and synthesis method thereof 南通大学 2023-06-02 CN claimed
EP-0399755-B1 Light-sensitive composition and presensitized plate for use in making lithographic printing plates FUJI PHOTO FILM CO LTD (JP) 1994-03-30 EP claimed
US-5112743-A Aromatic-aldehyde diazo resins FUJI PHOTO FILM CO., LTD. (JP) 1992-05-12 US claimed
EP-0399755-A1 Light-sensitive composition and presensitized plate for use in making lithographic printing plates Fuji Photo Film Co., Ltd. (JP) 1990-11-28 EP claimed
CN-118324633-A Method for preparing ethyl 2-chloro-3-oxopropionate 海门瑞一医药科技有限公司 2024-07-12 CN disclosed
CN-116710430-A Methods and compounds for restoring mutant p53 function 皮姆维制药公司 2023-09-05 CN disclosed
CN-111875557-B Thiazole derivative and synthesis method thereof 南通大学 2023-06-02 CN disclosed
CN-103889563-B Composite polyamide membranes derived from carboxylic acid-containing acyl halide monomers 陶氏环球技术有限责任公司 2017-03-29 CN disclosed
CN-103328088-B Method for solubilizing carboxylic acid-containing compounds in hydrocarbon solvents DOW GLOBAL TECHNOLOGIES LLC (US) 2016-02-03 CN disclosed
CN-103906741-A Aminoalkyl substituted N-thienylbenzamide derivatives ASTELLAS PHARMA INC 2014-07-02 CN disclosed
CN-103906509-A Enkephalinase inhibitors THERAVANCE INC 2014-07-02 CN disclosed
CN-103889563-A Composite polyamide membranes derived from carboxylic acid-containing acyl halide monomers DOW GLOBAL TECHNOLOGIES INC 2014-06-25 CN disclosed
CN-101180299-B Ethynyl-pyrazolopyrimidine derivatives as MGLUR2 antagonists HOFFMANN LA ROCHE 2010-12-15 CN disclosed
CN-101410397-A Organic compounds NOVARTIS AG (CH) 2009-04-15 CN disclosed
CN-101180299-A Ethynyl-pyrazolopyrimidine derivatives as MGLUR2 antagonists HOFFMANN LA ROCHE (CH) 2008-05-14 CN disclosed
EP-0487343-B1 Process for preparing a lithographic plate FUJI PHOTO FILM CO LTD (JP) 1999-04-28 EP disclosed
EP-0399755-B1 Light-sensitive composition and presensitized plate for use in making lithographic printing plates FUJI PHOTO FILM CO LTD (JP) 1994-03-30 EP disclosed
EP-0487343-A1 Process for preparing a lithographic plate Fuji Photo Film Co., Ltd. (JP) 1992-05-27 EP disclosed
US-5112743-A Aromatic-aldehyde diazo resins FUJI PHOTO FILM CO., LTD. (JP) 1992-05-12 US disclosed
EP-0399755-A1 Light-sensitive composition and presensitized plate for use in making lithographic printing plates Fuji Photo Film Co., Ltd. (JP) 1990-11-28 EP disclosed