SCHEMBL83978

SCHEMBL83978

C=C(C(=O)O)c1ccc(O)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CPT1B Q92523 1/20 0.58
CA1 P00915 3/20 0.56
CA2 P00918 3/20 0.56
CA12 O43570 2/20 0.56
CA7 P43166 2/20 0.56
CA9 Q16790 2/20 0.56
CA14 Q9ULX7 2/20 0.56
CA3 P07451 1/20 0.56
TYR P14679 1/20 0.56
DRD1 P21728 1/20 0.56
CA4 P22748 1/20 0.56
CA6 P23280 1/20 0.56
CA5A P35218 1/20 0.56
CA5B Q9Y2D0 1/20 0.56
MAPT P10636 4/20 0.52
HTT P42858 2/20 0.52
LMNA P02545 2/20 0.52
GFER P55789 2/20 0.52
ESR1 P03372 1/20 0.52
ESR2 Q92731 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28626731 0.91 CPT1B (0.50) CPT1BCA1CA2CA12CA7
SCHEMBL713716 0.89 TSHR (0.47) CPT1BCA1CA2CA12CA7
SCHEMBL5417792 0.86 PKM (0.46) CPT1BCA1CA2CA12CA7
SCHEMBL28338099 0.82 TSHR (0.63) CA1CA2CA12CA7CA9
SCHEMBL19026597 0.82 MAPT (0.44) CA1CA2CA12CA9CA14
SCHEMBL11434334 0.80 CPT1B (0.58) CPT1BCA1CA2CA12CA7
SCHEMBL44226 0.79 CES1 (0.52) CA1CA2CA12CA7CA9
SCHEMBL8999129 0.78 CES2 (0.54) CA1CA2HTTCES2KMT2A
SCHEMBL1124581 0.78 ALDH1A1 (0.58) MAPTHTTLMNAPKMHPGD
SCHEMBL9812557 0.78 HAO1 (0.46) CPT1BCA1CA2CA12CA7

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 344 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119640355-A Surface antioxidation treatment process for electrolytic copper foil 广东嘉元时代新能源材料有限公司 2025-03-18 CN claimed
CN-117430802-B Preparation method of polyhydroxy acrylic ester macromer, method for preparing polymer polyol by using polyhydroxy acrylic ester macromer and application of polyhydroxy acrylic ester macromer 山东一诺威新材料有限公司 2024-05-10 CN claimed
CN-117430802-A Preparation method of polyhydroxy acrylic ester macromer, method for preparing polymer polyol by using polyhydroxy acrylic ester macromer and application of polyhydroxy acrylic ester macromer 山东一诺威新材料有限公司 2024-01-23 CN claimed
CN-114105807-B Hydroxycyclohexanamide compound and preparation method and application thereof 暨南大学 2023-08-18 CN claimed
CN-115887772-A Gelatin/sodium alginate hydrogel-based 3D printing biological ink and application thereof 南京工业大学 2023-04-04 CN claimed
US-20230045151-A1 COMPOSITIONS AND METHODS MONASH UNIVERSITY (AU) 2023-02-09 US claimed
EP-4084784-A1 COMPOSITIONS AND METHODS Monash University (AU) 2022-11-09 EP claimed
CN-115181224-A Modified polyacrylamide drilling fluid coating agent and preparation method thereof 山东诺尔生物科技有限公司 2022-10-14 CN claimed
CN-114702710-A High-toughness light-stable PVC film and preparation method thereof 施黄健 2022-07-05 CN claimed
CN-114105807-A Hydroxycyclohexane diamide compound and preparation method and application thereof 暨南大学 2022-03-01 CN claimed
WO-2021142514-A1 COMPOSITIONS AND METHODS MONASH UNIVERSITY (AU) 2021-07-22 WO claimed
CN-113025099-A Graphene coating and preparation method thereof 尤纪超 2021-06-25 CN claimed
EP-1038668-B1 Photosensitive composition and planographic printing plate precursor using same FUJI PHOTO FILM CO LTD (JP) 2005-05-25 EP claimed
EP-0914964-B1 Positive type photosensitive composition for infrared lasers FUJI PHOTO FILM CO LTD (JP) 2004-12-29 EP claimed
US-20030143490-A1 Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof FUJITSU LIMITED (JP) 2003-07-31 US claimed
EP-0909657-B1 A positive type photosensitive image-forming material for an infrared laser FUJI PHOTO FILM CO LTD (JP) 2003-06-18 EP claimed
EP-0766140-B1 Positive presensitized lithographic printing plate and a process for producing the same FUJI PHOTO FILM CO LTD (JP) 2001-04-11 EP claimed
US-5932392-A LIGHT SENSITIVE LAYER CONTAINING A COMPOUND CAPABLE OF GENERATING AN ACID ON EXPOSURE OF INFRARED RAYS, A RESOL RESIN, AN UNSATURATED RESIN CONTAINING A MONOMER UNIT WITH A PHENOLIC HYDROXY GROUP, AND AN INFRARED ABSORBER KONICA CORPORATION (JP) 1999-08-03 US claimed
EP-0397375-B1 Photosensitive composition and photosensitive lithographic printing plate KONISHIROKU PHOTO IND (JP) 1994-04-06 EP claimed
EP-0397375-A1 Photosensitive composition and photosensitive lithographic printing plate KONICA CORPORATION (JP) 1990-11-14 EP claimed