SCHEMBL8399502

SCHEMBL8399502

C=C(O)C(=O)OC12CC3CC(CC(C3)C1)C2

nearest known ligand 0.39

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 4/20 0.39
NAAA Q02083 1/20 0.37
NPSR1 Q6W5P4 3/20 0.36
CYP17A1 P05093 3/20 0.36
EPHX2 P34913 2/20 0.36
THRB P10828 1/20 0.35
CYP2C9 P11712 1/20 0.35
EPHX1 P07099 1/20 0.34
CA2 P00918 1/20 0.34
TSHR P16473 1/20 0.33
MEN1 O00255 1/20 0.32
ALDH1A1 P00352 1/20 0.32
HTT P42858 1/20 0.32
KMT2A Q03164 1/20 0.32
GLA P06280 1/20 0.32
GAA P10253 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8519210 0.93 CYP19A1 (0.36) CYP19A1NAAANPSR1CYP17A1EPHX2
SCHEMBL16369107 0.85 CYP19A1 (0.40) CYP19A1NAAANPSR1CYP17A1EPHX2
SCHEMBL27736443 0.84 CYP19A1 (0.44) CYP19A1NAAANPSR1CYP17A1EPHX2
SCHEMBL21392499 0.83 CYP19A1 (0.39) CYP19A1NAAANPSR1CYP17A1EPHX2
SCHEMBL7183809 0.83 CYP19A1 (0.41) CYP19A1NAAANPSR1CYP17A1EPHX2
SCHEMBL22769989 0.82 CYP19A1 (0.38) CYP19A1NAAANPSR1CYP17A1EPHX2
SCHEMBL45476 0.82 NAAA (0.40) CYP19A1NAAANPSR1CYP17A1EPHX2
Methacrylic Acid SCHEMBL13504160 0.81 NAAA (0.37) CYP19A1NAAANPSR1CYP17A1EPHX2
SCHEMBL15348585 0.80 CYP19A1 (0.37) CYP19A1NAAANPSR1CYP17A1EPHX2
SCHEMBL28138951 0.80 NAAA (0.39) CYP19A1NAAANPSR1CYP17A1EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113307907-A Nonolactone polymer resin, preparation method thereof and preparation method of 193nm photoresist composition containing same 宁波南大光电材料有限公司 2021-08-27 CN disclosed
CN-1975572-B Resist composition DAICEL CHEM 2011-07-20 CN disclosed
CN-101482698-A Resist composition DAICEL CHEM (JP) 2009-07-15 CN disclosed
CN-1975572-A Resist composition DAICEL CHEM (JP) 2007-06-06 CN disclosed
CN-1782877-A Anti-corrosion agent composition DAICEL CHEM (JP) 2006-06-07 CN disclosed
US-5973094-A Functional polymers WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1999-10-26 US disclosed
EP-0794199-A2 Novel functional polymers WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 1997-09-10 EP disclosed