Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP19A1 | P11511 | 4/20 | 0.39 |
| ▸ | NAAA | Q02083 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.36 |
| ▸ | CYP17A1 | P05093 | 3/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.36 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.34 |
| ▸ | CA2 | P00918 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TGM2 | P21980 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | GLA | P06280 | 1/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.31 |
| ▸ | GAA | P10253 | 1/20 | 0.31 |
| ▸ | SCN1A | P35498 | 1/20 | 0.31 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.31 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16369107 | 0.85 | CYP19A1 (0.40) | CYP19A1NAAANPSR1CYP17A1EPHX2 | |
| SCHEMBL27736443 | 0.84 | CYP19A1 (0.44) | CYP19A1NAAANPSR1CYP17A1EPHX2 | |
| SCHEMBL8399502 | 0.83 | CYP19A1 (0.39) | CYP19A1NAAANPSR1CYP17A1EPHX2 | |
| SCHEMBL7928678 | 0.83 | CYP19A1 (0.41) | CYP19A1NAAANPSR1CYP17A1EPHX2 | |
| SCHEMBL22769989 | 0.82 | CYP19A1 (0.38) | CYP19A1NAAANPSR1CYP17A1EPHX2 | |
| SCHEMBL45476 | 0.82 | NAAA (0.40) | CYP19A1NAAANPSR1CYP17A1EPHX2 | |
| SCHEMBL21123182 | 0.81 | CYP19A1 (0.39) | CYP19A1NAAANPSR1CYP17A1EPHX2 | |
| SCHEMBL28138951 | 0.80 | NAAA (0.39) | CYP19A1NAAANPSR1CYP17A1EPHX2 | |
| SCHEMBL15348585 | 0.80 | CYP19A1 (0.37) | CYP19A1NAAANPSR1CYP17A1EPHX2 | |
| SCHEMBL7928675 | 0.79 | CYP19A1 (0.39) | CYP19A1NAAANPSR1CYP17A1EPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119200332-A | Layered structure for electron beam lithography process and lithography process thereof | 国科天骥(山东)新材料有限责任公司 | 2024-12-27 | — | — | CN | claimed |
| CN-119179230-A | Electron beam photoresist composition containing self-crosslinking resin and preparation method and application thereof | 国科天骥(山东)新材料有限责任公司 | 2024-12-24 | — | — | CN | claimed |
| CN-119200332-A | Layered structure for electron beam lithography process and lithography process thereof | 国科天骥(山东)新材料有限责任公司 | 2024-12-27 | — | — | CN | disclosed |
| CN-119179230-A | Electron beam photoresist composition containing self-crosslinking resin and preparation method and application thereof | 国科天骥(山东)新材料有限责任公司 | 2024-12-24 | — | — | CN | disclosed |
| US-11960207-B2 | Resist composition and resist film | ZEON CORPORATION (JP) | 2024-04-16 | — | — | US | disclosed |
| CN-113773433-B | Polymer resin and preparation method thereof, method for improving cracking of electron beam photoresist, electron beam photoresist and preparation and use thereof | 江苏汉拓光学材料有限公司 | 2023-12-29 | — | — | CN | disclosed |
| US-20210055654-A1 | RESIST COMPOSITION AND RESIST FILM | ZEON CORPORATION (JP) | 2021-02-25 | — | — | US | disclosed |
| US-20200407477-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2020-12-31 | — | — | US | disclosed |
| US-20200407477-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2020-12-31 | — | — | US | disclosed |
| EP-3751345-A1 | RESIST COMPOSITION AND RESIST FILM | Zeon Corporation (JP) | 2020-12-16 | — | — | EP | disclosed |
| WO-2019181582-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | 日本ゼオン株式会社 | 2019-09-26 | — | — | WO | disclosed |