SCHEMBL8417583

SCHEMBL8417583

Cc1c(C)c(Cc2c(C)c(C)c(O)c(O)c2C)c(C)c(O)c1O

nearest known ligand 0.34

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
IGF1R P08069 1/20 0.34
SRC P12931 1/20 0.34
AXL P30530 1/20 0.34
PTK2 Q05397 1/20 0.34
AURKB Q96GD4 1/20 0.34
ALK Q9UM73 1/20 0.34
FASN P49327 1/20 0.34
TP53 P04637 1/20 0.34
CYP2C9 P11712 1/20 0.34
CYP2C19 P33261 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
HIF1A Q16665 1/20 0.34
CA1 P00915 1/20 0.33
CA2 P00918 1/20 0.33
PTPN1 P18031 1/20 0.33
CA4 P22748 1/20 0.33
CA6 P23280 1/20 0.33
SIRT1 Q96EB6 1/20 0.31
NQO1 P15559 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11166245 0.91 FASN (0.33) FASNTP53CYP2C9CYP2C19SMN1; SMN2
SCHEMBL68926 0.90 FASN (0.35) FASNTP53CYP2C9CYP2C19SMN1; SMN2
SCHEMBL16475965 0.85 CYP2C19 (0.42) FASNTP53CYP2C9CYP2C19SMN1; SMN2
SCHEMBL69870 0.81 CYP2C19 (0.43) FASNTP53CYP2C9CYP2C19SMN1; SMN2
SCHEMBL10386355 0.81 CYP2C19 (0.43) IGF1RSRCAXLPTK2AURKB
SCHEMBL68436 0.78 SIRT1 (0.39) FASNTP53CYP2C9CYP2C19SMN1; SMN2
SCHEMBL23928766 0.75 CA2 (0.37) IGF1RSRCAXLPTK2AURKB
SCHEMBL25327513 0.73 ALOX5 (0.35)
SCHEMBL17482328 0.73 UPP1 (0.37) IGF1RSRCAXLPTK2AURKB
SCHEMBL14074123 0.73 TAAR1 (0.38) IGF1RSRCAXLPTK2AURKB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0731074-B1 Tetraphenol compounds, process for producing the same and their use as photosensitisers SUMITOMO CHEMICAL CO (JP) 1999-09-22 EP disclosed
US-5726217-A PHOTOSENSITIZERS FOR POSITIVE RESISTS SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1998-03-10 US disclosed
EP-0731074-A2 Tetraphenol compounds, process for producing the same and their use as photosensitisers SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1996-09-11 EP disclosed