SCHEMBL8418972

SCHEMBL8418972

CN(C)CCc1cc(CCN(C)C)c(CCN(C)C)cc1O

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 0.54
KMT2A Q03164 4/20 0.54
TDP1 Q9NUW8 4/20 0.54
THRB P10828 3/20 0.54
KDM4E B2RXH2 3/20 0.54
MAPT P10636 3/20 0.54
ALDH1A1 P00352 2/20 0.54
POLB P06746 2/20 0.54
HKDC1 Q2TB90 2/20 0.54
L3MBTL1 Q9Y468 2/20 0.54
GAA P10253 1/20 0.54
G6PD P11413 1/20 0.54
PABPC1 P11940 1/20 0.54
HTR1A P08908 4/20 0.47
HTR2A P28223 6/20 0.47
HTR2C P28335 5/20 0.46
HTR2B P41595 3/20 0.46
TAAR1 Q96RJ0 3/20 0.45
HTR7 P34969 2/20 0.42
SLC6A4 P31645 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5983338 0.75 HRH3 (0.50) KDM4EHTR1AHTR2AHTR2CHTR2B
SCHEMBL10949866 0.75 AMY1A (0.52) MEN1KMT2ATDP1THRBKDM4E
SCHEMBL5192245 0.74 PRKCI (0.58) MEN1KMT2ATDP1THRBKDM4E
SCHEMBL9759946 0.74 HTR2A (0.45) MEN1KMT2ATDP1THRBKDM4E
SCHEMBL14755444 0.72 HTR2A (0.43) MEN1KMT2ATDP1THRBKDM4E
SCHEMBL4467416 0.71 ALDH1A1 (0.90) MEN1KMT2ATDP1THRBKDM4E
SCHEMBL3624706 0.71 HTR1D (0.54) MEN1KMT2ATDP1KDM4EMAPT
SCHEMBL36797 0.71 HTR2A (0.65) HTR1AHTR2AHTR2CHTR2BTAAR1
SCHEMBL374864 0.71 MDM2 (0.45) HTR1AHTR2AHTR2CHTR2BTAAR1
SCHEMBL11127980 0.70 ALDH1A1 (1.00) MEN1KMT2ATDP1THRBKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0487291-B1 Photocurable silicon composition, and method of making same LOCTITE CORP (US) 1999-09-29 EP disclosed
US-5348986-A Polysiloxanes capped with mixture of curable groups, gels, acrylated polymers LOCTITE CORPORATION (US) 1994-09-20 US disclosed
US-5212211-A Adhesives, coatings LOCTITE CORPORATION (US) 1993-05-18 US disclosed
EP-0487291-A2 Photocurable silicon composition, and method of making same LOCTITE CORPORATION (US) 1992-05-27 EP disclosed
EP-0101587-B1 POSITIVE PROCESS FOR OBTAINING RELIEF OR RESIST PATTERNS BASF Aktiengesellschaft (DE) 1987-01-21 EP disclosed
US-4456679-A Production of relief images or resist images by a positive-working method BASF AKTIENGESELLSCHAFT (DE) 1984-06-26 US disclosed
EP-0101587-A2 Positive process for obtaining relief or resist patterns BASF Aktiengesellschaft (DE) 1984-02-29 EP disclosed