SCHEMBL8419939

SCHEMBL8419939

CCC(C)[Si](Br)(Br)C(C)CC

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8419619 0.79 TSHR (0.33) TSHR
SCHEMBL17138297 0.79 TSHR (0.33) TSHR
SCHEMBL8421244 0.79
SCHEMBL11237601 0.77 TSHR (0.38) TSHR
SCHEMBL28584453 0.76
SCHEMBL8419671 0.76 TSHR (0.32) TSHR
SCHEMBL8419919 0.73 TSHR (0.30) TSHR
SCHEMBL8421018 0.73 TSHR (0.30) TSHR
SCHEMBL8419529 0.73 TSHR (0.30) TSHR
SCHEMBL8741580 0.73 TSHR (0.30) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250060673-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RES CORP (US) 2025-02-20 US claimed
WO-2023115023-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RESEARCH CORPORATION (US) 2023-06-22 WO claimed
US-20250060673-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RES CORP (US) 2025-02-20 US disclosed
CN-108375878-B Polymerizable composition, method for producing cured film, and cured film 东京应化工业株式会社 2023-12-08 CN disclosed
US-11718717-B2 Resin composition, method for producing resin composition, film formation method, and cured product TOKYO OHKA KOGYO CO., LTD. (JP) 2023-08-08 US disclosed
WO-2023115023-A1 DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS LAM RESEARCH CORPORATION (US) 2023-06-22 WO disclosed
US-20200392292-A1 RESIN COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, FILM FORMATION METHOD, AND CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2020-12-17 US disclosed
US-10767017-B2 Resin composition, method for producing resin composition, film formation method, and cured product TOKYO OHKA KOGYO CO., LTD. (JP) 2020-09-08 US disclosed
CN-104974184-B preparation of silazane Compounds 信越化学工业株式会社 2019-12-06 CN disclosed
US-20180179338-A1 RESIN COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, FILM FORMATION METHOD, AND CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2018-06-28 US disclosed
EP-2930177-B1 PREPARATION OF SILAZANE COMPOUND SHINETSU CHEMICAL CO (JP) 2018-04-25 EP disclosed
US-9416147-B2 Preparation of silazane compound SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-16 US disclosed
EP-2930177-A1 Preparation of silazane compound Shin-Etsu Chemical Co., Ltd. (JP) 2015-10-14 EP disclosed
US-20150284414-A1 PREPARATION OF SILAZANE COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-10-08 US disclosed
US-5997637-A Method of producing a semiconducting material NIPPON OIL CO., LTD. (JP) 1999-12-07 US disclosed
EP-0632086-B1 A method of producing a semiconducting material NIPPON OIL CO LTD (JP) 1999-10-06 EP disclosed
EP-0632086-A2 A method of producing a semiconducting material NIPPON OIL CO., LTD. (JP) 1995-01-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200392292-A1 RESIN COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, FILM FORMATION METHOD, AND CURED PRODUCT SEM1, RER1, SMCHD1 TSHR 4195/4885
US-11718717-B2 Resin composition, method for producing resin composition, film formation method, and cured product SEM1, RER1, SMCHD1 TSHR 4195/4885
US-10767017-B2 Resin composition, method for producing resin composition, film formation method, and cured product SEM1, RER1, FDFT1 TSHR 3941/4885
US-20150284414-A1 PREPARATION OF SILAZANE COMPOUND SLTM, SKP2, BCAT2 TSHR 4559/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.