Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP1 | P09874 | 3/20 | 0.45 |
| ▸ | MEN1 | O00255 | 4/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.36 |
| ▸ | PKM | P14618 | 2/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.35 |
| ▸ | PARG | Q86W56 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.32 |
| ▸ | CES2 | O00748 | 1/20 | 0.32 |
| ▸ | BCHE | P06276 | 1/20 | 0.32 |
| ▸ | CES1 | P23141 | 1/20 | 0.32 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 3/20 | 0.31 |
| ▸ | CASP7 | P55210 | 2/20 | 0.31 |
| ▸ | RGS12 | O14924 | 1/20 | 0.31 |
| ▸ | USP2 | O75604 | 1/20 | 0.31 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5668275 | 0.82 | PARP1 (0.47) | PARP1MEN1KMT2APKMSMN1; SMN2 | |
| SCHEMBL2041353 | 0.81 | PARP1 (0.51) | PARP1MEN1KMT2APKMSMN1; SMN2 | |
| SCHEMBL1516405 | 0.80 | PARP1 (0.47) | PARP1MEN1KMT2APKMSMN1; SMN2 | |
| SCHEMBL28590452 | 0.80 | PARP1 (0.50) | PARP1MEN1KMT2APKMSMN1; SMN2 | |
| SCHEMBL7046262 | 0.80 | ALDH1A1 (0.48) | PARP1MEN1KMT2APKMSMN1; SMN2 | |
| SCHEMBL1419748 | 0.75 | PARP1 (0.42) | PARP1MEN1KMT2APKMSMN1; SMN2 | |
| SCHEMBL28678417 | 0.74 | PARP1 (0.58) | PARP1MEN1KMT2ASMN1; SMN2NPSR1 | |
| SCHEMBL29089233 | 0.74 | PARP1 (0.66) | PARP1MEN1KMT2APKMSMN1; SMN2 | |
| SCHEMBL17726920 | 0.73 | PARP1 (0.61) | PARP1MEN1KMT2APKMSMN1; SMN2 | |
| SCHEMBL84234 | 0.72 | MAPT (0.33) | MEN1KMT2ANPSR1ALDH1A1CES1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | claimed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | claimed |
| WO-2019171188-A1 | PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-09-12 | — | — | WO | disclosed |
| CN-109782540-A | The forming method of photoetching agent pattern | 台湾积体电路制造股份有限公司 | 2019-05-21 | — | — | CN | disclosed |
| EP-2742385-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | International Business Machines Corporation (US) | 2014-06-18 | — | — | EP | disclosed |
| WO-2014078789-A1 | METHODS FOR FORMING NANOPARTICLES USING SEMICONDUCTOR MANUFACTURING INFRASTRUCTURE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-22 | — | — | WO | disclosed |
| WO-2013190406-A1 | ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-27 | — | — | WO | disclosed |
| WO-2013023124-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-14 | — | — | WO | disclosed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | disclosed |
| WO-2011101259-A2 | SULFONAMIDE-CONTAINING TOPCOAT AND PHOTORESIST ADDITIVE COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | WO | disclosed |
| WO-2011101260-A2 | SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | WO | disclosed |
| WO-2010114716-A1 | USING ELECTRIC-FIELD DIRECTED POST-EXPOSURE BAKE FOR DOUBLE PATTERNING (D-P) | TOKYO ELECTRON LIMITED (JP) | 2010-10-07 | — | — | WO | disclosed |
| WO-2010094531-A1 | ULTRA LOW POST EXPOSURE BAKE PHOTORESIST MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-26 | — | — | WO | disclosed |
| EP-1996144-A2 | COMPOSITE MATERIAL, IN PARTICULAR A DENTAL FILLING MATERIAL | Dentofit A/S (DK) | 2008-12-03 | — | — | EP | disclosed |
| US-7419611-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-02 | — | — | US | disclosed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | disclosed |
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | disclosed |
| WO-2007104312-A2 | COMPOSITE MATERIAL, IN PARTICULAR A DENTAL FILLING MATERIAL | DENTOFIT A/S (DK) | 2007-09-20 | — | — | WO | disclosed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | disclosed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | disclosed |