Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
| ▸ | CDK4 | P11802 | 5/20 | 0.32 |
| ▸ | CCND1 | P24385 | 5/20 | 0.32 |
| ▸ | CCNE2 | O96020 | 3/20 | 0.32 |
| ▸ | CCNE1 | P24864 | 3/20 | 0.32 |
| ▸ | CDK2 | P24941 | 3/20 | 0.32 |
| ▸ | CAMK2B | Q13554 | 2/20 | 0.32 |
| ▸ | CAMK2G | Q13555 | 2/20 | 0.32 |
| ▸ | CAMK2D | Q13557 | 2/20 | 0.32 |
| ▸ | CAMK2A | Q9UQM7 | 2/20 | 0.32 |
| ▸ | CES1 | P23141 | 2/20 | 0.32 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CASP3 | P42574 | 1/20 | 0.32 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.31 |
| ▸ | TUBB | P07437 | 1/20 | 0.31 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1029435 | 0.80 | ALDH1A1 (0.42) | MAPTALDH1A1NPSR1CDK4CCND1 | |
| SCHEMBL1516404 | 0.79 | ADORA2A (0.35) | MAPTALDH1A1NPSR1CDK4CCND1 | |
| SCHEMBL7046260 | 0.79 | KMT2A (0.46) | MAPTALDH1A1TUBB4ATUBBTUBA3C | |
| SCHEMBL15543485 | 0.74 | CA1 (0.35) | MAPTALDH1A1NPSR1CDK4CCND1 | |
| SCHEMBL16415844 | 0.73 | CA1 (0.36) | MAPTALDH1A1NPSR1CDK4CCND1 | |
| SCHEMBL84235 | 0.72 | PARP1 (0.45) | MAPTALDH1A1NPSR1CES1CASP3 | |
| SCHEMBL11667133 | 0.70 | CES1 (0.39) | MAPTALDH1A1CDK4CCND1CCNE2 | |
| SCHEMBL13813789 | 0.69 | CA12 (0.47) | ALDH1A1NPSR1CA1MEN1KMT2A | |
| SCHEMBL7430843 | 0.69 | GPR84 (0.41) | MAPTALDH1A1NPSR1CDK4CCND1 | |
| SCHEMBL5764686 | 0.68 | ALDH1A1 (0.35) | ALDH1A1NPSR1CDK4CCND1CCNE2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | claimed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | claimed |
| WO-2019171188-A1 | PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2019-09-12 | — | — | WO | disclosed |
| EP-2742385-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | International Business Machines Corporation (US) | 2014-06-18 | — | — | EP | disclosed |
| WO-2014078789-A1 | METHODS FOR FORMING NANOPARTICLES USING SEMICONDUCTOR MANUFACTURING INFRASTRUCTURE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-22 | — | — | WO | disclosed |
| WO-2013190406-A1 | ORGANIC SOLVENT DEVELOPABLE PHOTORESIST COMPOSITION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-27 | — | — | WO | disclosed |
| WO-2013023124-A2 | DEVELOPABLE BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS FOR NEGATIVE RESISTS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-02-14 | — | — | WO | disclosed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | disclosed |
| WO-2011101259-A2 | SULFONAMIDE-CONTAINING TOPCOAT AND PHOTORESIST ADDITIVE COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | WO | disclosed |
| WO-2011101260-A2 | SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-08-25 | — | — | WO | disclosed |
| WO-2011054572-A1 | SILICON CONTAINING COATING COMPOSITIONS AND METHODS OF USE | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-05-12 | — | — | WO | disclosed |
| WO-2010114716-A1 | USING ELECTRIC-FIELD DIRECTED POST-EXPOSURE BAKE FOR DOUBLE PATTERNING (D-P) | TOKYO ELECTRON LIMITED (JP) | 2010-10-07 | — | — | WO | disclosed |
| WO-2010094531-A1 | ULTRA LOW POST EXPOSURE BAKE PHOTORESIST MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-26 | — | — | WO | disclosed |
| EP-1996144-A2 | COMPOSITE MATERIAL, IN PARTICULAR A DENTAL FILLING MATERIAL | Dentofit A/S (DK) | 2008-12-03 | — | — | EP | disclosed |
| US-7419611-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-02 | — | — | US | disclosed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | disclosed |
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | disclosed |
| WO-2007104312-A2 | COMPOSITE MATERIAL, IN PARTICULAR A DENTAL FILLING MATERIAL | DENTOFIT A/S (DK) | 2007-09-20 | — | — | WO | disclosed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | disclosed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | disclosed |