Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | CYP2A6 | P11509 | 3/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.37 |
| ▸ | HPGD | P15428 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.37 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.37 |
| ▸ | ACP3 | P15309 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 1/20 | 0.36 |
| ▸ | F2 | P00734 | 1/20 | 0.36 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.36 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.36 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.36 |
| ▸ | HPRT1 | P00492 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15067822 | 0.82 | ALDH1A1 (0.40) | ALDH1A1CYP2A6HSD17B10KDM4EMAPT | |
| SCHEMBL26208769 | 0.82 | ALDH1A1 (0.40) | ALDH1A1CYP2A6HSD17B10KDM4EMAPT | |
| SCHEMBL9015724 | 0.82 | ALDH1A1 (0.47) | ALDH1A1CYP2A6HSD17B10KDM4ETSHR | |
| SCHEMBL28654871 | 0.81 | ALDH1A1 (0.43) | ALDH1A1CYP2A6HSD17B10KDM4EMAPT | |
| SCHEMBL7196892 | 0.80 | ALDH1A1 (0.41) | ALDH1A1CYP2A6HSD17B10KDM4EMAPT | |
| SCHEMBL4196250 | 0.80 | NR1I2 (0.32) | ALDH1A1KDM4ECYP1A2HPGDNR1I2 | |
| SCHEMBL29947075 | 0.79 | MAPK1 (0.42) | ALDH1A1HSD17B10KDM4ETSHRTDP1 | |
| SCHEMBL6900861 | 0.79 | MAPK1 (0.42) | ALDH1A1HSD17B10KDM4ETSHRTDP1 | |
| SCHEMBL26208770 | 0.79 | KDM4E (0.38) | ALDH1A1CYP2A6HSD17B10KDM4EMAPT | |
| SCHEMBL547819 | 0.78 | ALDH1A1 (0.44) | ALDH1A1CYP2A6HSD17B10KDM4EMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230280655-A1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-07 | — | — | US | disclosed |
| US-8835092-B2 | Resist underlayer film composition, process for forming resist underlayer film, patterning process and fullerene derivative | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-09-16 | — | — | US | disclosed |
| US-20110195362-A1 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-11 | — | — | US | disclosed |
| US-20110195362-A1 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-11 | — | — | US | disclosed |
| US-5955509-A | POLY(VINYL N-HETEROCYCLE)-BLOCK-POLY(ALKYLENE OXIDE) COPOLYMERS IN MICELLE CONTAINING PHARMACEUTICAL FORMULATIONS. | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 1999-09-21 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110195362-A1 | RESIST UNDERLAYER FILM COMPOSITION, PROCESS FOR FORMING RESIST UNDERLAYER FILM, PATTERNING PROCESS AND FULLERENE DERIVATIVE | PARG, TOP2A, FRG1 | ALDH1A1 3305/4885CYP2A6 2052/4885HSD17B10 2418/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.