Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.44 |
| ▸ | CYP2A6 | P11509 | 3/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 3/20 | 0.44 |
| ▸ | ACP3 | P15309 | 2/20 | 0.42 |
| ▸ | HSD17B10 | Q99714 | 5/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.42 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | HPGD | P15428 | 3/20 | 0.40 |
| ▸ | MEN1 | O00255 | 3/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.39 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29380144 | 1.00 | ALDH1A1 (0.44) | ALDH1A1CYP2A6CYP1A2ACP3HSD17B10 | |
| SCHEMBL548252 | 0.85 | CA2 (0.46) | ALDH1A1CYP2A6CYP1A2HSD17B10TSHR | |
| SCHEMBL10010552 | 0.84 | PPARG (0.42) | ALDH1A1CYP2A6CYP1A2HSD17B10TSHR | |
| SCHEMBL27559429 | 0.83 | HSD17B10 (0.44) | ALDH1A1CYP2A6CYP1A2ACP3HSD17B10 | |
| SCHEMBL19443085 | 0.83 | ALDH1A1 (0.41) | ALDH1A1CYP2A6CYP1A2ACP3HSD17B10 | |
| SCHEMBL20013957 | 0.83 | ALDH1A1 (0.41) | ALDH1A1CYP2A6CYP1A2ACP3HSD17B10 | |
| SCHEMBL9270026 | 0.82 | DHFR (0.42) | ALDH1A1CYP2A6CYP1A2HSD17B10TSHR | |
| SCHEMBL18802803 | 0.82 | CA2 (0.39) | ALDH1A1CYP1A2HSD17B10TSHRKDM4E | |
| SCHEMBL1561798 | 0.81 | CYP1A2 (0.48) | ALDH1A1CYP2A6CYP1A2ACP3HSD17B10 | |
| SCHEMBL11786019 | 0.81 | CYP1A2 (0.48) | ALDH1A1CYP2A6CYP1A2ACP3HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 184 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4746757-A | OZIDIZING AN ISOPROPYLNAPHTHALENE COMPOUND WITH A PEROXODISULFATE | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1988-05-24 | — | — | US | claimed |
| US-4021495-A | Purification of β-naphthol | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-05-03 | — | — | US | claimed |
| US-20250025443-A1 | COMPOUNDS AND METHODS FOR TREATING CORONA VIRUSES | Clear Creek Bio, Inc. (US) | 2025-01-23 | — | — | US | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-20230280655-A1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-07 | — | — | US | disclosed |
| US-20230280655-A1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-07 | — | — | US | disclosed |
| WO-2023064493-A1 | COMPOUNDS AND METHODS FOR TREATING CORONAVIRUSES | Clear Creek Bio, Inc. (US) | 2023-04-20 | — | — | WO | disclosed |
| CN-113227041-B | Process for producing nitroso compound and quinoxaline compound | 组合化学工业株式会社 | 2023-03-24 | — | — | CN | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| CN-113651308-A | Azalea leaf derived carbon material and preparation method and application thereof | 浙江工业大学 | 2021-11-16 | — | — | CN | disclosed |
| US-4746757-A | OZIDIZING AN ISOPROPYLNAPHTHALENE COMPOUND WITH A PEROXODISULFATE | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1988-05-24 | — | — | US | disclosed |
| US-4746757-A | OZIDIZING AN ISOPROPYLNAPHTHALENE COMPOUND WITH A PEROXODISULFATE | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1988-05-24 | — | — | US | disclosed |
| US-4746757-A | OZIDIZING AN ISOPROPYLNAPHTHALENE COMPOUND WITH A PEROXODISULFATE | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1988-05-24 | — | — | US | disclosed |
| CN-85107531-A | Process for producing vinyl chloride polymer | — | 1987-01-21 | — | — | CN | disclosed |
| EP-0172427-A2 | Process for production of vinyl chloride polymer | Shin-Etsu Chemical Co., Ltd. (JP) | 1986-02-26 | — | — | EP | disclosed |
| US-4174460-A | Process for the hydroxylation of phenols and phenol ethers in the nucleus | BAYER AKTIENGESELLSCHAFT (DE) | 1979-11-13 | — | — | US | disclosed |
| US-4111917-A | POLYURETHANES | W. R. GRACE & CO. (US) | 1978-09-05 | — | — | US | disclosed |
| US-4045496-A | Process for the hydroxylation of phenols and phenol ethers in the nucleus | BAYER AKTIENGESELLSCHAFT (DT) | 1977-08-30 | — | — | US | disclosed |
| US-4021495-A | Purification of β-naphthol | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1977-05-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | ALDH1A1 3830/4885CYP2A6 3824/4885CYP1A2 4327/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | ALDH1A1 1540/4885CYP2A6 1959/4885CYP1A2 1713/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | ALDH1A1 1540/4885CYP2A6 1959/4885CYP1A2 1713/4885 |
| US-20250025443-A1 | COMPOUNDS AND METHODS FOR TREATING CORONA VIRUSES | ACE, PREP, PEPD | ALDH1A1 2460/4885CYP2A6 1756/4885CYP1A2 2421/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.