Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 2/20 | 0.61 |
| ▸ | MEN1 | O00255 | 1/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.55 |
| ▸ | MAPT | P10636 | 3/20 | 0.51 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.51 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.51 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.51 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | HTT | P42858 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6010329 | 0.83 | KMT2A (0.56) | KMT2AMEN1ALDH1A1MAPTNPSR1 | |
| SCHEMBL11503858 | 0.75 | ALDH1A1 (0.67) | KMT2AALDH1A1CYP3A4TP53HTT | |
| SCHEMBL7793913 | 0.74 | ALDH1A1 (0.36) | KMT2AMEN1ALDH1A1MAPTKDM4E | |
| SCHEMBL5845946 | 0.71 | SMN1; SMN2 (0.38) | KMT2AMEN1ALDH1A1MAPTKDM4E | |
| SCHEMBL4391996 | 0.70 | ALDH1A1 (0.58) | KMT2AALDH1A1MAPTNPSR1KDM4E | |
| SCHEMBL22402709 | 0.70 | SIGMAR1 (0.44) | KMT2AMEN1ALDH1A1MAPTNPSR1 | |
| SCHEMBL21903467 | 0.69 | MAPT (0.96) | KMT2AMEN1ALDH1A1MAPTNPSR1 | |
| SCHEMBL843571 | 0.68 | EPHX1 (0.59) | KMT2AMEN1ALDH1A1MAPTNPSR1 | |
| SCHEMBL18568029 | 0.67 | SMN1; SMN2 (0.58) | KMT2AALDH1A1CYP3A4TP53HTT | |
| SCHEMBL6010066 | 0.67 | KMT2A (0.50) | KMT2AALDH1A1KDM4ECYP3A4TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 65 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1199603-B1 | Positive photosensitive composition | FUJIFILM CORP (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-8252503-B2 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-08-28 | — | — | US | disclosed |
| EP-1367439-B1 | Radiation-sensitive composition | FUJIFILM CORP (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-RE43560-E1 | Positive photosensitive compositions | FUJIFILM CORPORATION (JP) | 2012-07-31 | — | — | US | disclosed |
| EP-1179750-B1 | Positive photosensitive composition and method for producing a precision integrated circuit element using the same | FUJIFILM CORP (JP) | 2012-07-25 | — | — | EP | disclosed |
| EP-1273970-B1 | Positive photosensitive composition | FUJIFILM CORP (JP) | 2012-03-28 | — | — | EP | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| EP-2296040-A1 | Positive photosensitive composition | Fujifilm Corporation (JP) | 2011-03-16 | — | — | EP | disclosed |
| EP-2296039-A1 | Positive photosensitive composition | Fujifilm Corporation (JP) | 2011-03-16 | — | — | EP | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20020058200-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| US-20020058206-A1 | Positive resist composition | FUJI PHOTO FILM CO., LTD. | 2002-05-16 | — | — | US | disclosed |
| US-20020051933-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2002-05-02 | — | — | US | disclosed |
| EP-1199603-A1 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2002-04-24 | — | — | EP | disclosed |
| EP-1193556-A1 | Positive resist composition | Fuji Photo Film Co., Ltd. (JP) | 2002-04-03 | — | — | EP | disclosed |
| EP-1179750-A1 | Positive photosensitive composition | Fuji Photo Film Co., Ltd. (JP) | 2002-02-13 | — | — | EP | disclosed |
| US-20010055726-A1 | Positive radiation-sensitive composition | FUJI PHOTO FILM CO., LTD. | 2001-12-27 | — | — | US | disclosed |
| US-20010041300-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| US-6265135-B1 | ARYL SULFONIUM OR IODONIUM COMPOUND WHICH GENERATES BENZENE-, NAPHTHALENE- OR ANTHRACENESULFONIC ACID WHICH IS SUBSTITUTED BY AT LEAST ONE FLUORINE ATOM AND/OR AT LEAST ONE GROUP CONTAINING A FLUORINE ATOM. | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-24 | — | — | US | disclosed |
| EP-1117002-A1 | Negative-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-07-18 | — | — | EP | disclosed |