SCHEMBL843600

SCHEMBL843600

[O]C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.44
THRB P10828 1/20 0.43
CA2 P00918 3/20 0.39
CA1 P00915 2/20 0.36
MMP1 P03956 2/20 0.36
MMP2 P08253 2/20 0.36
MMP9 P14780 2/20 0.36
MMP8 P22894 2/20 0.36
MMP13 P45452 2/20 0.36
F2 P00734 1/20 0.32
PRSS1 P07477 1/20 0.32
PRSS2 P07478 1/20 0.32
PRSS3 P35030 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1006161 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1
SCHEMBL1006074 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1
SCHEMBL1005294 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1
SCHEMBL1006397 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1
SCHEMBL1006453 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1
SCHEMBL1007393 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1
SCHEMBL330805 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1
SCHEMBL910572 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1
SCHEMBL1007075 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1
SCHEMBL1006646 1.00 LMNA (0.44) LMNATHRBCA2CA1MMP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 402 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4397405-A1 CARBON DIOXIDE CAPTURING AGENT, METAL-ORGANIC FRAMEWORK, AND COMPOUND ENEOS Corporation (JP) 2024-07-10 EP disclosed
US-12034122-B2 Electrolytic solution for lithium-ion secondary battery and lithium-ion secondary battery MURATA MANUFACTURING CO., LTD. (JP) 2024-07-09 US disclosed
CN-115003751-B Polymer composition, molded body, and optical member 住友化学株式会社 2024-07-09 CN disclosed
CN-112074983-B Electrolyte for lithium ion secondary battery and lithium ion secondary battery 株式会社村田制作所 2024-06-04 CN disclosed
CN-117897225-A Carbon dioxide scavenger, metal-organic structure, and compound 引能仕株式会社 2024-04-16 CN disclosed
US-20240122065-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN TOSOH CORPORATION (JP) 2024-04-11 US disclosed
US-20230405155-A1 NANOPARTICLE, PHOTOACOUSTIC CONTRAST AGENT, PHOTODYNAMIC THERAPY DRUG, AND PHOTOTHERMAL THERAPY DRUG SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-12-21 US disclosed
CN-116761861-A polarizing plate 住友化学株式会社 2023-09-15 CN disclosed
EP-4241846-A1 NANOPARTICLES, PHOTOACOUSTIC CONTRAST AGENT, PHOTODYNAMIC THERAPEUTIC AGENT, AND PHOTOTHERMAL THERAPEUTIC AGENT SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-13 EP disclosed
EP-4198163-A1 METAL PATTERNING MATERIAL, AMINE COMPOUND, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN Tosoh Corporation (JP) 2023-06-21 EP disclosed
US-6265135-B1 ARYL SULFONIUM OR IODONIUM COMPOUND WHICH GENERATES BENZENE-, NAPHTHALENE- OR ANTHRACENESULFONIC ACID WHICH IS SUBSTITUTED BY AT LEAST ONE FLUORINE ATOM AND/OR AT LEAST ONE GROUP CONTAINING A FLUORINE ATOM. FUJI PHOTO FILM CO., LTD. (JP) 2001-07-24 US disclosed
EP-1117004-A2 Electron beam or x-ray negative-working resist composition FUJI PHOTO FILM CO., LTD. (JP) 2001-07-18 EP disclosed
EP-1117002-A1 Negative-working resist composition FUJI PHOTO FILM CO., LTD. (JP) 2001-07-18 EP disclosed
EP-1109066-A1 Chemical amplification type negative-working resist composition for electron beams or x-rays FUJI PHOTO FILM CO., LTD. (JP) 2001-06-20 EP disclosed
US-6238752-B1 MODIFIED DIAMINE CHISSO CORPORATION (JP) 2001-05-29 US disclosed
EP-1076261-A1 Negative resist composition FUJI PHOTO FILM CO., LTD. (JP) 2001-02-14 EP disclosed
EP-1020442-A1 NOVEL DIAMINO COMPOUNDS, POLYAMIC ACID, POLYIMIDE, LIQUID-CRYSTAL ALIGNMENT FILM MADE FROM FILM OF THE POLYIMIDE, AND LIQUID-CRYSTAL DISPLAY ELEMENT CONTAINING THE ALIGNMENT FILM Chisso Corporation (JP) 2000-07-19 EP disclosed
US-6090909-A Uv-ray-dimerized high molecular compound, liquid crystal aligning film using above high molecular compound and liquid crystal display element using above aligning film CHISSO CORPORATION (JP) 2000-07-18 US disclosed
US-5248339-A Polyfluoropolyphazenes EASTMAN KODAK COMPANY (US) 1993-09-28 US disclosed
US-3938999-A SURFACE ACTIVE ADDITION COPOLYMER FUJI PHOTO FILM CO., LTD. (JA) 1976-02-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230405155-A1 NANOPARTICLE, PHOTOACOUSTIC CONTRAST AGENT, PHOTODYNAMIC THERAPY DRUG, AND PHOTOTHERMAL THERAPY DRUG CRY2, RB1, NR2E3 LMNA 3317/4885THRB 720/4885CA2 284/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.