Acrylic Acid Ethyl Ester

Acrylic Acid Ethyl Ester

SCHEMBL8438535

C=C(C)C(=O)O.C=C(CC=Cc1ccccc1)C(=O)OC.C=CC(=O)OCC

nearest known ligand 0.40

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAB9A P51151 4/20 0.40
PAM P19021 1/20 0.40
ADORA3 P0DMS8 2/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
LMNA P02545 3/20 0.38
NPC1 O15118 3/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
ALDH1A1 P00352 3/20 0.38
MAOB P27338 2/20 0.38
KDM4E B2RXH2 2/20 0.38
MAPT P10636 2/20 0.37
MAOA P21397 1/20 0.37
HPGD P15428 1/20 0.37
XBP1 P17861 1/20 0.37
CTDSP1 Q9GZU7 1/20 0.37
NPSR1 Q6W5P4 1/20 0.36
DHFR P00374 1/20 0.36
ALOX12 P18054 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acrylic Acid Ethyl Ester SCHEMBL4746546 0.95 PAM (0.43) RAB9APAMADORA3MEN1KMT2A
Acrylic Acid Ethyl Ester SCHEMBL5931097 0.92 RAB9A (0.40) RAB9APAMADORA3MEN1KMT2A
Methacrylic Acid SCHEMBL491632 0.88 PAM (0.50) RAB9APAMMEN1KMT2ALMNA
Acrylic Acid Ethyl Ester SCHEMBL2458591 0.87 PAM (0.46) RAB9APAMADORA3MEN1KMT2A
SCHEMBL9876554 0.85 PAM (0.42) PAMMEN1KMT2ALMNANPC1
SCHEMBL678004 0.84 TSHR (0.49) PAMMEN1KMT2AL3MBTL1ALDH1A1
SCHEMBL678463 0.83 PAM (0.50) RAB9APAMMEN1KMT2ALMNA
SCHEMBL96726 0.83 PAM (0.56) PAMMEN1KMT2ALMNANPC1
Styrene SCHEMBL5820294 0.82 MEN1 (0.43) RAB9AADORA3MEN1KMT2ALMNA
Acrylic Acid Ethyl Ester SCHEMBL7900245 0.82 TSHR (0.46) RAB9APAMMEN1KMT2ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5952429-A A BLACK PHOTOCURABLE RESIN COMPOSITION IS OBTAINED BY MIXING UNDER HEATING A BLOCK- OR GRAFT-COPOLYMER WITH CARBON BLACK; IMPROVED PHOTOSENSITIVITY, INSULATING PROPERTY; FORMING A BLACK MATRIX PARTICULARLY IN A COLOR FILTER NIPPON SHOKUBAI CO., LTD. (JP) 1999-09-14 US disclosed
EP-0787777-A1 CARBON BLACK GRAFT POLYMER, PROCESS FOR THE PRODUCTION OF THE POLYMER AND USE THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 1997-08-06 EP disclosed