Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 3/20 | 0.44 |
| ▸ | CES1 | P23141 | 3/20 | 0.44 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.42 |
| ▸ | PPARG | P37231 | 7/20 | 0.42 |
| ▸ | PPARD | Q03181 | 7/20 | 0.42 |
| ▸ | PPARA | Q07869 | 7/20 | 0.42 |
| ▸ | HDAC11 | Q96DB2 | 5/20 | 0.42 |
| ▸ | TSHR | P16473 | 5/20 | 0.42 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | TLR2 | O60603 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | FABP4 | P15090 | 2/20 | 0.42 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.42 |
| ▸ | SLC22A8 | Q8TCC7 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | ESR1 | P03372 | 1/20 | 0.42 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.42 |
| ▸ | PDE4A | P27815 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9019586 | 1.00 | CES2 (0.44) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL4645612 | 1.00 | CES2 (0.44) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL28006135 | 1.00 | CES2 (0.44) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL23213958 | 1.00 | CES2 (0.44) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL9019580 | 1.00 | CES2 (0.44) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL23213954 | 1.00 | CES2 (0.44) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL845324 | 1.00 | CES2 (0.44) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL4645615 | 1.00 | CES2 (0.44) | CES2CES1GPR84PPARGPPARD | |
| SCHEMBL1791083 | 0.90 | CES1 (0.39) | CES2CES1TSHRALDH1A1 | |
| SCHEMBL1791082 | 0.90 | CES1 (0.39) | CES2CES1TSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 68 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2021070491-A1 | PHOTOCURABLE COMPOSITION FOR NANOIMPRINTING | サンアプロ株式会社 | 2021-04-15 | — | — | WO | disclosed |
| EP-2434342-B1 | Method for producing curable composition for imprints | FUJIFILM CORP (JP) | 2018-06-20 | — | — | EP | disclosed |
| EP-2556532-B1 | CURABLE COMPOSITION FOR IMPRINTS AND PRODUCING METHOD OF POLYMERIZABLE MONOMER FOR IMPRINTS | FUJIFILM CORP (JP) | 2017-12-20 | — | — | EP | disclosed |
| EP-2342243-B1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORP (JP) | 2017-12-06 | — | — | EP | disclosed |
| US-9684233-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2017-06-20 | — | — | US | disclosed |
| US-9663671-B2 | Curable composition for imprints and method of storing the same | FUJIFILM CORPORATION (JP) | 2017-05-30 | — | — | US | disclosed |
| EP-2553713-B1 | NANOIMPRINTING METHOD AND METHOD FOR PRODUCING A MOLD | FUJIFILM CORP (JP) | 2017-03-01 | — | — | EP | disclosed |
| US-9441065-B2 | Curable composition for imprints, cured product and method for manufacturing a cured product | FUJIFILM CORPORATION (JP) | 2016-09-13 | — | — | US | disclosed |
| US-9335628-B2 | Curable composition for imprints, patterning method and pattern | FUJIFILM CORPORATION (JP) | 2016-05-10 | — | — | US | disclosed |
| US-9005512-B2 | Method for forming patterns and method for producing patterned substrates | FUJIFILM CORPORATION (JP) | 2015-04-14 | — | — | US | disclosed |
| US-20100121013-A1 | CURABLE COMPOSITION FOR PHOTOIMPRINT, ITS CURED PRODUCT AND PRODUCTION METHOD FOR IT, AND COMPONENT OF LIQUID-CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2010-05-13 | — | — | US | disclosed |
| US-20100009138-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009287-A1 | CURABLE COMPOSITION FOR IMPRINTS, PATTERNING METHOD AND PATTERN | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| US-20100009137-A1 | COMPOSITION FOR IMPRINTS, PATTERN AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| CN-101620377-A | Curing combination for nanometer stamping, condensate and method for producing the same, and members for liquid crystal display device | FUJI PHOTO FILM CO LTD | 2010-01-06 | — | — | CN | disclosed |
| CN-101620376-A | Curing combination for stamping, condensate using the combination and method for producing the same, and members for liquid crystal display device | FUJI PHOTO FILM CO LTD | 2010-01-06 | — | — | CN | disclosed |
| US-20090283937-A1 | CURABLE COMPOSITION FOR NANOIMPRINT, AND PATTERNING METHOD | FUJIFILM CORPORATION (JP) | 2009-11-19 | — | — | US | disclosed |
| US-20090011367-A1 | INTERFACE BINDER, RESIST COMPOSITION CONTAINING THE SAME, LAMINATE FOR FORMING MAGNETIC RECORDING MEDIUM HAVING LAYER CONTAINING THE SAME, MANUFACTURING METHOD OF MAGNETIC RECORDING MEDIUM USING THE SAME, AND MAGNETIC RECORDING MEDIUM PRODUCED BY THE MANUFACTURING METHOD | FUJIFILM CORPORATION (JP) | 2009-01-08 | — | — | US | disclosed |
| CN-101154042-A | Curing composition for nano-imprint lithography and pattern forming method using the same | FUJIFILM CORP (JP) | 2008-04-02 | — | — | CN | disclosed |
| CN-101105625-A | Light solidifying composition and pattern forming method using the same | FUJIFILM CORP (JP) | 2008-01-16 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100121013-A1 | CURABLE COMPOSITION FOR PHOTOIMPRINT, ITS CURED PRODUCT AND PRODUCTION METHOD FOR IT, AND COMPONENT OF LIQUID-CRYSTAL DISPLAY DEVICE | MBTD1, CRY1, CCNT1 | CES2 860/4885CES1 2436/4885GPR84 3748/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.