Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 2/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.34 |
| ▸ | CA9 | Q16790 | 1/20 | 0.34 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.34 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.34 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.34 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.34 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.34 |
| ▸ | HDAC10 | Q969S8 | 1/20 | 0.34 |
| ▸ | HDAC11 | Q96DB2 | 1/20 | 0.34 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.34 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.34 |
| ▸ | HDAC9 | Q9UKV0 | 1/20 | 0.34 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 5/20 | 0.33 |
| ▸ | MEN1 | O00255 | 3/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.33 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.33 |
| ▸ | THRB | P10828 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL3957928 | 0.90 | ACACB (0.35) | MAPTMEN1KMT2AKDM4ESMN1; SMN2 | |
| Trifluoromethanesulfonic Acid SCHEMBL8069550 | 0.89 | HSP90AA1 (0.34) | CA2CA12CA1CA9HDAC3 | |
| Trifluoromethanesulfonic Acid SCHEMBL8078870 | 0.89 | HSP90AA1 (0.34) | CA2CA12CA1CA9HDAC3 | |
| Trifluoromethanesulfonic Acid SCHEMBL8592503 | 0.87 | CA2 (0.40) | CA2CA1MAPTMEN1KMT2A | |
| SCHEMBL8323353 | 0.85 | ALDH1A1 (0.41) | MAPTMEN1KMT2AKDM4ETHRB | |
| SCHEMBL5609606 | 0.85 | ALDH1A1 (0.41) | MAPTMEN1KMT2AKDM4ETHRB | |
| SCHEMBL248025 | 0.85 | ALDH1A1 (0.41) | MAPTMEN1KMT2AKDM4ETHRB | |
| SCHEMBL8318829 | 0.85 | ALDH1A1 (0.36) | CA2CA12CA1CA9HDAC3 | |
| Trifluoromethanesulfonic Acid SCHEMBL5619591 | 0.85 | PPARA (0.34) | MAPTMEN1KMT2ASMN1; SMN2TP53 | |
| Trifluoromethanesulfonic Acid SCHEMBL3964223 | 0.85 | PPARA (0.34) | MAPTMEN1KMT2ASMN1; SMN2TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5569784-A | FINE PATTERN; PREVENTS POST-EXPOSURE DELAY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-10-29 | — | — | US | claimed |
| EP-0665220-B1 | Novel sulfonium salt and chemically amplified positive resist composition | SHINETSU CHEMICAL CO (JP) | 1999-04-07 | — | — | EP | disclosed |
| EP-0667338-B1 | Sulfonium salt and resist composition | SHINETSU CHEMICAL CO (JP) | 1998-01-07 | — | — | EP | disclosed |
| US-5691112-A | P-TOLUENESULFONIC ACID TRIS(P-TERT-BUTOXYPHENYL) SULFONIUM AS PHOTOSENSITIVE ACID GENERATOR; FORMING SOLUBLE SURFACE LAYER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-11-25 | — | — | US | disclosed |
| US-5633409-A | POSITIVE RESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-05-27 | — | — | US | disclosed |
| US-5569784-A | FINE PATTERN; PREVENTS POST-EXPOSURE DELAY | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1996-10-29 | — | — | US | disclosed |
| EP-0667338-A1 | Sulfonium salt and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-08-16 | — | — | EP | disclosed |
| EP-0665220-A1 | Novel sulfonium salt and chemically amplified positive resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1995-08-02 | — | — | EP | disclosed |