SCHEMBL8517079

SCHEMBL8517079

C=C(O)C(=O)NCc1ccccc1

nearest known ligand 0.63

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.58
KMT2A Q03164 3/20 0.58
MEN1 O00255 2/20 0.58
MAPT P10636 1/20 0.58
GAA P10253 1/20 0.55
L3MBTL1 Q9Y468 2/20 0.54
CYP2C19 P33261 3/20 0.53
CYP2D6 P10635 2/20 0.53
CYP1A2 P05177 1/20 0.53
CYP2C9 P11712 1/20 0.53
TSHR P16473 1/20 0.53
HPGD P15428 1/20 0.52
ALOX12 P18054 1/20 0.52
SMN1; SMN2 Q16637 3/20 0.52
EPHX1 P07099 1/20 0.52
LMNA P02545 1/20 0.52
TXNRD1 Q16881 1/20 0.50
CYP3A4 P08684 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3056874 0.87 KMT2A (0.71) ALDH1A1KMT2AMEN1MAPTGAA
SCHEMBL16628771 0.86 ALDH1A1 (0.56) ALDH1A1KMT2AMEN1MAPTGAA
SCHEMBL183463 0.84 ALDH1A1 (0.59) ALDH1A1KMT2AMEN1MAPTGAA
SCHEMBL14417753 0.84 KMT2A (0.54) ALDH1A1KMT2AMEN1MAPTGAA
SCHEMBL6658418 0.84 ALDH1A1 (0.54) ALDH1A1KMT2AMEN1MAPTGAA
SCHEMBL1867492 0.83 ALDH1A1 (0.61) ALDH1A1KMT2AMEN1MAPTGAA
SCHEMBL5175379 0.82 TXNRD1 (0.54) ALDH1A1KMT2AMEN1MAPTGAA
SCHEMBL957078 0.82 TP53 (0.54) ALDH1A1KMT2AMEN1MAPTGAA
SCHEMBL5698188 0.82 TXNRD1 (0.54) ALDH1A1KMT2AMEN1MAPTGAA
SCHEMBL24584925 0.81 TXNRD1 (0.52) ALDH1A1KMT2AMEN1MAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0731113-B1 Polymers and photosensitive compositions obtained therefrom AGFA GEVAERT AG (DE) 1999-01-13 EP disclosed
US-5700621-A COPOLYMER BINDER OF ACRYLAMIDE OR ALKYLACRYLAMIDE AND ACIDIC HYDROGEN ATOM CONTAINING UNIT DERIVED FROM SULFONIC, CARBOXYLIC, PHOSPHONIC, CARBOXIMIDES, SULFONAMIDES, SULFONIMIDES AND PHENOLS AGFA-GEVAERT AG (DE) 1997-12-23 US disclosed
EP-0731113-A2 Polymers and photosensitive compositions obtained therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1996-09-11 EP disclosed
EP-0440086-B1 Radiation-sensitive composition, radiation-sensitive recording material produced therewith and process for the production of relief records HOECHST AG (DE) 1995-10-25 EP disclosed
EP-0440057-B1 Radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AG (DE) 1995-09-27 EP disclosed
US-5376496-A Radiation-sensitive mixture, radiation-sensitive recording material produced therewith containing halogenated methyl groups in the polymeric binder HOECHST AKTIENGESELLSCHAFT (DE) 1994-12-27 US disclosed
US-5275908-A Lithographic plates with chemical resistance or photoresists with heat resistance HOECHST AKTIENGESELLSCHAFT (DE) 1994-01-04 US disclosed
EP-0440057-A2 Radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-08-07 EP disclosed
EP-0440086-A2 Radiation-sensitive composition, radiation-sensitive recording material produced therewith and process for the production of relief records HOECHST AKTIENGESELLSCHAFT (DE) 1991-08-07 EP disclosed