Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.42 |
| ▸ | HTT | P42858 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | HCAR1 | Q9BXC0 | 1/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.38 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 2/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.38 |
| ▸ | MITF | O75030 | 1/20 | 0.38 |
| ▸ | CCR6 | P51684 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.37 |
| ▸ | CASP7 | P55210 | 1/20 | 0.37 |
| ▸ | GRM5 | P41594 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28211416 | 0.80 | GAA (0.52) | KMT2AHTTALDH1A1MEN1MAPT | |
| SCHEMBL2076686 | 0.75 | HTT (0.61) | KMT2AHTTALDH1A1MEN1L3MBTL1 | |
| SCHEMBL17625895 | 0.75 | KMT2A (0.47) | KMT2AHTTALDH1A1MEN1L3MBTL1 | |
| SCHEMBL4541704 | 0.72 | KMT2A (0.40) | KMT2AHTTALDH1A1MEN1HCAR1 | |
| SCHEMBL30160986 | 0.72 | MAPK1 (0.45) | KMT2AHTTALDH1A1MEN1L3MBTL1 | |
| SCHEMBL11421424 | 0.72 | ALDH1A1 (0.30) | ALDH1A1 | |
| SCHEMBL9655479 | 0.71 | KMT2A (0.45) | KMT2AHTTALDH1A1MEN1HCAR1 | |
| SCHEMBL9736258 | 0.71 | MAPT (0.50) | KMT2AHTTALDH1A1MEN1L3MBTL1 | |
| SCHEMBL29950577 | 0.71 | GRM5 (0.40) | KMT2AHTTALDH1A1MEN1L3MBTL1 | |
| SCHEMBL27398905 | 0.71 | ACHE (0.48) | KMT2AHTTALDH1A1MEN1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-1991017840-A1 | PROCESS FOR MAKING FINE CONDUCTOR LINES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-11-28 | — | — | WO | claimed |
| EP-3947511-A1 | TWO COMPONENT (2K) COMPOSITION BASED ON MODIFIED EPOXY RESINS | Henkel AG & Co. KGaA (DE) | 2022-02-09 | — | — | EP | disclosed |
| WO-2020199156-A1 | TWO COMPONENT (2K) COMPOSITION BASED ON MODIFIED EPOXY RESINS | HENKEL AG & CO. KGAA (DE) | 2020-10-08 | — | — | WO | disclosed |
| WO-2020191690-A1 | PHOTO-CURABLE COMPOSITIONS FOR ADDITIVE MANUFACTURING | HENKEL AG & CO. KGAA (DE) | 2020-10-01 | — | — | WO | disclosed |
| US-6001836-A | ANTAGONISTS OF NPY-INDUCED FEEDING BEHAVIOR | BRISTOL-MYERS SQUIBB COMPANY (US) | 1999-12-14 | — | — | US | disclosed |
| WO-1998054136-A1 | DIHYDROPYRIDINE NPY ANTAGONISTS: CYANOGUANIDINE DERIVATIVES | BRISTOL-MYERS SQUIBB COMPANY (US) | 1998-12-03 | — | — | WO | disclosed |
| US-5426016-A | Method of forming and removing resist pattern | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1995-06-20 | — | — | US | disclosed |
| US-5252433-A | Selectively expose resist layer to light, introduce germanium compound into exposed portions, subjecting resist layer to antisotropic oxygen etching, removing resist pattern with acid | MITSUBISHI DENKI KABUSHIKI KAISHA (JP) | 1993-10-12 | — | — | US | disclosed |
| WO-1991017840-A1 | PROCESS FOR MAKING FINE CONDUCTOR LINES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1991-11-28 | — | — | WO | disclosed |
| EP-0083975-B1 | HERBICIDAL SULFONAMIDES | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1987-11-19 | — | — | EP | disclosed |