SCHEMBL8526384

SCHEMBL8526384

O=S(=O)(c1ccc(C2CCCCC2)cc1)c1ccc(O)c(S(=O)(=O)c2ccc(C3CCCCC3)cc2)c1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.50
HTT P42858 4/20 0.50
ACMSD Q8TDX5 2/20 0.47
SMN1; SMN2 Q16637 4/20 0.45
ALDH1A1 P00352 3/20 0.45
MAPT P10636 3/20 0.45
TP53 P04637 1/20 0.45
ATM Q13315 1/20 0.45
POLB P06746 3/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
XBP1 P17861 1/20 0.44
PTGES2 Q9H7Z7 1/20 0.44
GAA P10253 3/20 0.43
GFER P55789 1/20 0.43
PKM P14618 1/20 0.42
APOBEC3A P31941 1/20 0.42
APOBEC3G Q9HC16 1/20 0.42
SERPINE1 P05121 1/20 0.41
TSHR P16473 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9645924 0.88 SERPINE1 (0.54) LMNAHTTACMSDSMN1; SMN2ALDH1A1
SCHEMBL9297221 0.83 ACMSD (0.57) LMNAHTTACMSDSMN1; SMN2ALDH1A1
SCHEMBL10182181 0.82 LMNA (0.68) LMNAHTTSMN1; SMN2ALDH1A1MAPT
SCHEMBL10180298 0.80 LMNA (0.65) LMNAHTTSMN1; SMN2ALDH1A1MAPT
SCHEMBL10785889 0.80 LMNA (0.48) LMNAHTTACMSDSMN1; SMN2ALDH1A1
Resorcinol SCHEMBL8415130 0.77 LMNA (0.50) LMNAHTTSMN1; SMN2ALDH1A1MAPT
SCHEMBL9296645 0.76 HSP90AA1 (0.58) LMNAHTTACMSDMAPTPOLB
SCHEMBL8306482 0.76 LMNA (0.60) LMNAHTTSMN1; SMN2ALDH1A1MAPT
SCHEMBL7126365 0.76 POLB (0.66) LMNAALDH1A1MAPTPOLBGAA
SCHEMBL8367580 0.75 ACMSD (0.55) LMNAHTTACMSDPTGES2SERPINE1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0706997-B1 Sulfonyl compound and thermal-sensitive recording medium using the same SANKO KAIHATSU KAGAKU KENK (JP) 1998-03-11 EP disclosed
US-5705452-A AS DEVELOPER; HIGH SENSITIVITY, LOW BACKGROUND BLUSH DURING STORAGE, RESISTANCE TO HEAT, MOISTURE, PLASTICIZER SANKO HAIHATSU KAGAKU KENKYUSHO (JP) 1998-01-06 US disclosed
EP-0706997-A1 Sulfonyl compound and thermal-sensitive recording medium using the same Sanko Kaihatsu Kagaku Kenkyusho (JP) 1996-04-17 EP disclosed