SCHEMBL8526842

SCHEMBL8526842

O=C(OC1CC=CCC1)c1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CHRNA7 P36544 5/20 0.54
▸ MEN1 O00255 1/20 0.53
▸ KMT2A Q03164 1/20 0.53
▸ HTR3E A5X5Y0 1/20 0.51
▸ HTR3B O95264 1/20 0.51
▸ HTR3A P46098 1/20 0.51
▸ HTR3D Q70Z44 1/20 0.51
▸ HTR3C Q8WXA8 1/20 0.51
▸ APOBEC3A P31941 1/20 0.50
▸ APOBEC3G Q9HC16 1/20 0.50
▸ GAA P10253 1/20 0.49
▸ SCN1A P35498 1/20 0.46
▸ SCN2A Q99250 1/20 0.46
▸ SCN3A Q9NY46 1/20 0.46
▸ CARM1 Q86X55 1/20 0.45
▸ PRMT6 Q96LA8 1/20 0.45
▸ TSHR P16473 1/20 0.43
▸ POLB P06746 1/20 0.43
▸ MAPT P10636 1/20 0.43
▸ CYP2C9 P11712 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4160023 0.88 CHRNA7 (0.57) CHRNA7MEN1KMT2AHTR3EHTR3B
SCHEMBL27404414 0.81 CHRNA7 (0.55) CHRNA7MEN1KMT2AHTR3EHTR3B
SCHEMBL1267583 0.81 MEN1 (0.61) CHRNA7MEN1KMT2AHTR3EHTR3B
SCHEMBL1926317 0.80 MEN1 (0.65) CHRNA7MEN1KMT2AHTR3EHTR3B
SCHEMBL9248196 0.80 MEN1 (0.65) CHRNA7MEN1KMT2AHTR3EHTR3B
SCHEMBL1786140 0.80 MEN1 (0.69) CHRNA7MEN1KMT2AHTR3EHTR3B
SCHEMBL4453290 0.80 MEN1 (0.69) CHRNA7MEN1KMT2AHTR3EHTR3B
SCHEMBL9509179 0.80 ALDH1A1 (0.50) MEN1KMT2AGAATSHRPOLB
SCHEMBL6397345 0.79 CHRNA7 (0.47) CHRNA7MEN1KMT2AHTR3EHTR3B
SCHEMBL6397350 0.79 CHRNA7 (0.47) CHRNA7MEN1KMT2AHTR3EHTR3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0249139-B2 Resist compositions and use MICROSI INC (US) 1998-03-11 — — EP claimed
US-5362607-A Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt MICROSI, INC. (US) 1994-11-08 — — US claimed
US-5310619-A Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable MICROSI, INC. (US) 1994-05-10 — — US claimed
EP-0249139-B2 Resist compositions and use MICROSI INC (US) 1998-03-11 — — EP disclosed
US-4044041-A CARBOXYLIC ACID WITH CONJUGATED DIENE PHILLIPS PETROLEUM COMPANY (US) 1977-08-23 — — US disclosed
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