SCHEMBL8528650

SCHEMBL8528650

CCCC(C)C(O)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9737021 0.84 LMNA (0.48)
SCHEMBL5907187 0.84 ALDH1A1 (0.46)
SCHEMBL15178185 0.82 LMNA (0.46)
SCHEMBL11298441 0.82 LMNA (0.46)
SCHEMBL31509452 0.82 LMNA (0.46)
SCHEMBL3685759 0.82 CYP2D6 (0.52)
SCHEMBL10962159 0.81
SCHEMBL2301800 0.81 TSHR (0.42)
SCHEMBL2811312 0.80 CYP2D6 (0.55)
SCHEMBL2806965 0.80 CYP2D6 (0.55)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12637804-B2 Ink jet recording method SEIKO EPSON CORPORATION (JP) 2026-05-26 US disclosed
US-20260125850-A1 Pretreatment Liquid For Textile Printing And Textile Printing Method SEIKO EPSON CORP (JP) 2026-05-07 US disclosed
US-20260116073-A1 Maintenance Method And Recording Apparatus SEIKO EPSON CORP (JP) 2026-04-30 US disclosed
US-20260109872-A1 Ink Jet Ink Composition And Ink Jet Recording Method SEIKO EPSON CORP (JP) 2026-04-23 US disclosed
US-12584030-B2 Ink jet ink composition and recording method SEIKO EPSON CORPORATION (JP) 2026-03-24 US disclosed
US-20260062575-A1 Ink Set And Recording Method SEIKO EPSON CORP (JP) 2026-03-05 US disclosed
US-20250297119-A1 Method Of Using Ink, Ink Set, Method Of Producing Ink Jet Ink Composition, And Ink Jet Ink Composition SEIKO EPSON CORPORATION (JP) 2025-09-25 US disclosed
US-20250256522-A1 Recording Method And Recording Apparatus SEIKO EPSON CORPORATION (JP) 2025-08-14 US disclosed
US-20250179320-A1 Ink Set And Recording Method SEIKO EPSON CORPORATION (JP) 2025-06-05 US disclosed
US-12319825-B2 Ink jet ink composition and ink set SEIKO EPSON CORPORATION (JP) 2025-06-03 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
US-20140273447-A1 COMPOSITION FOR FORMING TITANIUM-CONTAINING RESIST UNDERLAYER FILM AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-09-18 US disclosed
EP-1385870-B1 PEPTIDES AS NS3-SERINE PROTEASE INHIBITORS OF HEPATITIS C VIRUS SCHERING CORP (US) 2010-03-17 EP disclosed
CN-1219953-A Fabric softening compound/composition PROCTER & GAMBLE (US) 1999-06-16 CN disclosed
CN-1196082-A Concentrated stable fabric softening compositions comprising chelants PROCTER & GAMBLE (US) 1998-10-14 CN disclosed
EP-0842250-A1 CONCENTRATED, STABLE FABRIC SOFTENING COMPOSITION THE PROCTER & GAMBLE COMPANY (US) 1998-05-20 EP disclosed
EP-0839179-A1 CONCENTRATED, WATER DISPERSIBLE, STABLE, FABRIC SOFTENING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 1998-05-06 EP disclosed
US-5747443-A BIODEGRADABLE QUATERNARY AMMONIUM COMPOUNDS THE PROCTER & GAMBLE COMPANY (US) 1998-05-05 US disclosed
WO-1997003170-A1 CONCENTRATED, WATER DISPERSIBLE, STABLE, FABRIC SOFTENING COMPOSITIONS THE PROCTER & GAMBLE COMPANY (US) 1997-01-30 WO disclosed
WO-1997003169-A1 CONCENTRATED, STABLE FABRIC SOFTENING COMPOSITION THE PROCTER & GAMBLE COMPANY (US) 1997-01-30 WO disclosed