SCHEMBL8528884

SCHEMBL8528884

CC(C)(C)C1C=C(C(=O)O)c2ccccc21

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.37
ALDH1A1 P00352 2/20 0.36
POLB P06746 2/20 0.36
HBB P68871 1/20 0.36
HSD17B10 Q99714 1/20 0.36
EDNRB P24530 1/20 0.35
EDNRA P25101 1/20 0.35
MAPT P10636 1/20 0.35
MEN1 O00255 1/20 0.34
LMNA P02545 1/20 0.34
HDAC3 O15379 1/20 0.33
HDAC4 P56524 1/20 0.33
HDAC7 Q8WUI4 1/20 0.33
HDAC8 Q9BY41 1/20 0.33
HDAC6 Q9UBN7 1/20 0.33
HDAC9 Q9UKV0 1/20 0.33
HDAC5 Q9UQL6 1/20 0.33
NCOR2 Q9Y618 1/20 0.33
CYP1A2 P05177 1/20 0.33
TSHR P16473 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Bicarbonate SCHEMBL29088375 0.78 POLB (0.35) KMT2AALDH1A1POLBHBBHSD17B10
Bicarbonate SCHEMBL29088377 0.78 POLB (0.35) KMT2AALDH1A1POLBHBBHSD17B10
SCHEMBL9296680 0.77 KMT2A (0.40) KMT2AALDH1A1POLBEDNRBEDNRA
SCHEMBL8535341 0.72 GPR3 (0.34) ALDH1A1LMNA
SCHEMBL27805192 0.71 EDNRB (0.37) KMT2AALDH1A1POLBEDNRBEDNRA
SCHEMBL5473851 0.71 GPR3 (0.33)
SCHEMBL6401896 0.69 HTR6 (0.36)
SCHEMBL31316342 0.69 EDNRB (0.39) KMT2AALDH1A1POLBEDNRBEDNRA
SCHEMBL31316341 0.69 EDNRB (0.39) KMT2AALDH1A1POLBEDNRBEDNRA
SCHEMBL27587946 0.67 NOS2 (0.36) ALDH1A1MAPTLMNATSHRGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0249139-B2 Resist compositions and use MICROSI INC (US) 1998-03-11 EP disclosed
US-5362607-A Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt MICROSI, INC. (US) 1994-11-08 US disclosed
US-5310619-A Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable MICROSI, INC. (US) 1994-05-10 US disclosed
EP-0249139-A2 Resist compositions and use MicroSi, Inc. (a Delaware corporation) (US) 1987-12-16 EP disclosed