SCHEMBL8529038

SCHEMBL8529038

CC(=O)OCCOC(C)[O]

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.48
TSHR P16473 4/20 0.48
CHRM5 P08912 2/20 0.43
CHRM1 P11229 2/20 0.43
CHRM3 P20309 2/20 0.43
PGR P06401 1/20 0.43
CHRM2 P08172 1/20 0.43
CHRM4 P08173 1/20 0.43
HTR1A P08908 1/20 0.43
CHRNB2 P17787 1/20 0.43
TBXA2R P21731 1/20 0.43
CHRNB4 P30926 1/20 0.43
CHRNA3 P32297 1/20 0.43
CHRNA7 P36544 1/20 0.43
CHRNA4 P43681 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
CHRNA10 Q9GZZ6 1/20 0.43
CHRNA9 Q9UGM1 1/20 0.43
GALR3 O60755 2/20 0.41
GAA P10253 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10383148 0.84 ALDH1A1 (0.46) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL5248026 0.83 ALDH1A1 (0.50) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL6668046 0.83 ALDH1A1 (0.50) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL330791 0.83 ALDH1A1 (0.50) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL1065760 0.80 ALDH1A1 (0.52) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL64593 0.79 ALDH1A1 (0.68) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL4148479 0.78 ALDH1A1 (0.50) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL7785077 0.78
SCHEMBL596543 0.77 ALDH1A1 (0.56) ALDH1A1TSHRCHRM5CHRM1CHRM3
SCHEMBL651557 0.77 ALDH1A1 (0.45) ALDH1A1TSHRCHRM5CHRM1CHRM3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118011733-A Positive photosensitive resin composition, resist film, resist underlayer film, and resist permanent film DIC株式会社 2024-05-10 CN disclosed
US-11543749-B2 Resist composition and method for producing resist pattern, and method for producing plated molded article SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-01-03 US disclosed
US-20210278765-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-09-09 US disclosed
CN-113296357-A Resist composition, method for producing resist pattern, and method for producing plated molded article 住友化学株式会社 2021-08-24 CN disclosed
EP-0827970-A3 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials Clariant AG (CH) 1998-12-30 EP disclosed
US-5852128-A Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT AG (CH) 1998-12-22 US disclosed
US-5852128-A Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials CLARIANT AG (CH) 1998-12-22 US disclosed
EP-0827970-A2 New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials Clariant AG (CH) 1998-03-11 EP disclosed