SCHEMBL853162

SCHEMBL853162

CCC(=O)OCCC(=O)OC1(CC)C2CC3CC(C2)CC1C3

nearest known ligand 0.37

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 15/20 0.37
NAAA Q02083 1/20 0.35
ALDH1A1 P00352 1/20 0.34
THRB P10828 1/20 0.34
MEN1 O00255 1/20 0.31
KMT2A Q03164 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL172815 0.85 CYP17A1 (0.35) ALDH1A1THRB
SCHEMBL853456 0.84 EPHX2 (0.33) EPHX2NAAAALDH1A1THRB
SCHEMBL853476 0.84 EPHX2 (0.34) EPHX2NAAAALDH1A1THRB
SCHEMBL824231 0.83 EPHX2 (0.32) EPHX2
SCHEMBL14982794 0.83 THRB (0.40) EPHX2ALDH1A1THRB
SCHEMBL12936734 0.82 ALDH1A1 (0.39) EPHX2ALDH1A1MEN1KMT2A
SCHEMBL47449 0.82 EPHX2 (0.32) EPHX2
SCHEMBL14878901 0.81 MEN1 (0.32) EPHX2ALDH1A1MEN1KMT2A
SCHEMBL12936863 0.80 EPHX2 (0.33) EPHX2
SCHEMBL10228820 0.80 CYP17A1 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142979-B2 Resist composition for immersion exposure and method of forming resist pattern using the same Tokyo Ohka Tokyo Co., Ltd. (JP) 2012-03-27 US disclosed
US-20090311627-A1 Resist composition for immersion exposure and method of forming resist pattern using the same TOKYO OHKA KOGYO CO., LTD. 2009-12-17 US disclosed