Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP17A1 | P05093 | 1/20 | 0.35 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.35 |
| ▸ | HSD11B1 | P28845 | 4/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | OPRM1 | P35372 | 3/20 | 0.31 |
| ▸ | OPRD1 | P41143 | 3/20 | 0.31 |
| ▸ | OPRK1 | P41145 | 3/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL853456 | 0.88 | EPHX2 (0.33) | CYP17A1CYP19A1ALDH1A1THRBLMNA | |
| SCHEMBL853162 | 0.85 | EPHX2 (0.37) | ALDH1A1THRB | |
| SCHEMBL4741912 | 0.85 | CYP17A1 (0.33) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL210241 | 0.85 | CYP17A1 (0.33) | CYP17A1CYP19A1HSD11B1ALDH1A1LMNA | |
| SCHEMBL2672518 | 0.85 | TRPA1 (0.36) | CYP17A1CYP19A1HSD11B1ALDH1A1 | |
| SCHEMBL12936734 | 0.85 | ALDH1A1 (0.39) | CYP17A1CYP19A1HSD11B1ALDH1A1 | |
| SCHEMBL2603148 | 0.84 | HSD11B1 (0.33) | CYP17A1CYP19A1HSD11B1ALDH1A1 | |
| SCHEMBL439938 | 0.82 | HSD11B1 (0.34) | CYP17A1CYP19A1HSD11B1ALDH1A1LMNA | |
| SCHEMBL25509620 | 0.82 | HSD11B1 (0.38) | CYP17A1CYP19A1HSD11B1 | |
| SCHEMBL10228820 | 0.82 | CYP17A1 (0.32) | CYP17A1CYP19A1HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2356516-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORP (JP) | 2017-10-25 | — | — | EP | disclosed |
| US-20160200702-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-07-14 | — | — | US | disclosed |
| US-20160200702-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-07-14 | — | — | US | disclosed |
| US-9235123-B2 | Resist composition and resist pattern forming method | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-01-12 | — | — | US | disclosed |
| US-8921029-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-12-30 | — | — | US | disclosed |
| US-8921029-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-12-30 | — | — | US | disclosed |
| US-8846294-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-09-30 | — | — | US | disclosed |
| US-20140287361-A1 | RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-09-25 | — | — | US | disclosed |
| US-8470513-B2 | Radiation-sensitive resin composition and polymer | JSR CORPORATION (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20120251946-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20100151379-A1 | COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-06-17 | — | — | US | disclosed |
| US-20090274977-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| US-20090274977-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| US-7604918-B2 | Photosensitive polymer and photoresist composition having the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2009-10-20 | — | — | US | disclosed |
| EP-2100870-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | JSR Corporation (JP) | 2009-09-16 | — | — | EP | disclosed |
| US-20090220886-A1 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-09-03 | — | — | US | disclosed |
| US-20090155719-A1 | Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods | CHEIL INDUSTRIES, INC. (KR) | 2009-06-18 | — | — | US | disclosed |
| US-7494763-B2 | Polyhydric phenol compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-02-24 | — | — | US | disclosed |
| US-20080248417-A1 | Polyhydric phenol compound and chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20070172760-A1 | Photosensitive polymer and photoresist composition having the same | SAMSUNG ELECTRONICS CO. LTD | 2007-07-26 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100151379-A1 | COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | C5, C1R, C9 | CYP17A1 689/4885CYP19A1 85/4885HSD11B1 653/4885 |
| US-20090155719-A1 | Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methods | AHR, PAH, MCHR1 | CYP17A1 274/4885CYP19A1 98/4885HSD11B1 181/4885 |
| US-20080248417-A1 | Polyhydric phenol compound and chemically amplified resist composition containing the same | CCNA1, C1R, CCNA2 | CYP17A1 923/4885CYP19A1 913/4885HSD11B1 1270/4885 |
| US-20090220886-A1 | POLYHYDRIC COMPOUND AND CHEMICALLY AMPLIFIED RESIST COMPOSITION CONTAINING THE SAME | C5, C1R, H1-4 | CYP17A1 1865/4885CYP19A1 1532/4885HSD11B1 2484/4885 |
| US-20090274977-A1 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION | RAD51, SLC11A2, XRCC6 | CYP17A1 965/4885CYP19A1 94/4885HSD11B1 2514/4885 |
| US-20160200702-A1 | SALT, ACID GENERATOR, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST PATTERN | RER1, FRG1, FGFR1 | CYP17A1 412/4885CYP19A1 389/4885HSD11B1 223/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.